검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Processing Control for 0.25 Mu-M X-Ray-Exposures of Commercially Available Resists - The Potential for Adaptive-Control Talor JW, Gamsky C, Rhyner S, Howes G, Dentinger P, Nelson C, Yang C, Reilly M Journal of Vacuum Science & Technology B, 13(6), 3078, 1995 |
| 2 |
Modeling and Simulations of a Positive Chemically Amplified Photoresist for X-Ray-Lithography Krasnoperova AA, Khan M, Rhyner S, Taylor JW, Zhu Y, Cerrina F Journal of Vacuum Science & Technology B, 12(6), 3900, 1994 |