화학공학소재연구정보센터
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No. Article
1 Ostwald Ripening-Mediated Grafting of Metal-Organic Frameworks on a Single Colloidal Nanocrystal to Form Uniform and Controllable MXF
Liu Y, Yang Y, Sun YJ, Song JB, Rudawski NG, Chen XY, Tan WH
Journal of the American Chemical Society, 141(18), 7407, 2019
2 Application of Impedance Spectroscopy and Surface Analysis to Obtain Oxide Film Thickness
Chen YM, Rudawski NG, Lambers E, Orazem ME
Journal of the Electrochemical Society, 164(9), C563, 2017
3 Ion beam-mixed Ge electrodes for high capacity Li rechargeable batteries
Rudawski NG, Yates BR, Holzworth MR, Jones KS, Elliman RG, Volinsky AA
Journal of Power Sources, 223, 336, 2013
4 SnO2 functionalized AlGaN/GaN high electron mobility transistor for hydrogen sensing applications
Hung ST, Chang CJ, Hsu CH, Chu BH, Lo CF, Hsu CC, Pearton SJ, Holzworth MR, Whiting PG, Rudawski NG, Jones KS, Dabiran A, Chow P, Ren F
International Journal of Hydrogen Energy, 37(18), 13783, 2012
5 Insights for void formation in ion-implanted Ge
Darby BL, Yates BR, Rudawski NG, Jones KS, Kontos A, Elliman RG
Thin Solid Films, 519(18), 5962, 2011
6 Effect of n- and p-type dopants on patterned amorphous regrowth
Morarka S, Rudawski NG, Law ME, Jones KS, Elliman RG
Journal of Vacuum Science & Technology B, 28(1), C1F1, 2010
7 Level set modeling of the orientation dependence of solid phase epitaxial regrowth
Morarka S, Rudawski NG, Law ME
Journal of Vacuum Science & Technology B, 26(1), 357, 2008
8 Influence of As on the formation of mask-edge defects during stressed solid phase epitaxy in patterned Si wafers
Rudawski NG, Jones KS, Elliman RG
Journal of Vacuum Science & Technology B, 26(1), 435, 2008
9 Effect of oxide on trench edge defect formation in ion-implanted silicon
Burbure N, Rudawski NG, Jones KS
Electrochemical and Solid State Letters, 10(6), H184, 2007