화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Quantitative SIMS measurement of high concentration of boron in silicon (up to 20 at.%) using an isotopic comparative method
Dubois C, Prudon G, Gautier B, Dupuy JC
Applied Surface Science, 255(4), 1377, 2008
2 Application of deconvolution to boron depth profiling in SiGe heterostructures
Yang MH, Goodman GG
Thin Solid Films, 508(1-2), 276, 2006
3 Latest developments for the CAMECA ULE-SIMS instruments: IMS Wf and SC-Ultra
de Chambost E, Merkulov A, Peres P, Rasser B, Schuhmacher M
Applied Surface Science, 231-2, 949, 2004