검색결과 : 10건
| No. | Article |
|---|---|
| 1 |
Influence of ion species of AuSi liquid metal alloy source-focused ion beam on SiO2/Si nanopatterning Aissat A, Benyettou F, Berbezier I, Vilcot JP Thin Solid Films, 669, 215, 2019 |
| 2 |
Atomic scale calculations of tungsten surface binding energy and beryllium-induced tungsten sputtering Yang X, Hassanein A Applied Surface Science, 293, 187, 2014 |
| 3 |
High sputtering yields of organic compounds by large gas cluster ions Ichiki K, Ninomiya S, Nakata Y, Honda Y, Seki T, Aoki T, Matsuo J Applied Surface Science, 255(4), 1148, 2008 |
| 4 |
Experimental evaluation of MgO sputtering yields by monochromatic Ne, Kr, or Xe ion beams Hine K, Yoshimura S, Ikuse K, Kiuchi M, Hashimoto J, Terauchi M, Nishitani M, Hamaguchi S Thin Solid Films, 517(2), 835, 2008 |
| 5 |
Sputtering yields of PMMA films bombarded by keV C60+ ions Bolotin IL, Tetzler SH, Hanley L Applied Surface Science, 252(19), 6533, 2006 |
| 6 |
High-intensity Si cluster ion emission from a silicon target bombarded with large Ar cluster ions Ninomiya S, Aoki T, Seki T, Matsuo J Applied Surface Science, 252(19), 6550, 2006 |
| 7 |
Secondary ion measurements for oxygen cluster ion SIMS Ninomiya S, Aoki T, Seki T, Matsuo J Applied Surface Science, 252(19), 7290, 2006 |
| 8 |
Apparent and real transient effects in SIMS depth profiling using oxygen bombardment Wittmaack K Applied Surface Science, 203, 20, 2003 |
| 9 |
The dose dependence of Si sputtering with low energy ions in shallow depth profiling Moon DW, Lee HI Applied Surface Science, 203, 27, 2003 |
| 10 |
Low-Energy Ar Ion-Induced and Chlorine Ion Etching of Silicon Balooch M, Moalem M, Wang WE, Hamza AV Journal of Vacuum Science & Technology A, 14(1), 229, 1996 |