화학공학소재연구정보센터
검색결과 : 9건
No. Article
1 Optimization of ISBD embedded SiGe layers to prevent delamination process for MOSFET applications
Wasyluk J, Ge Y, Wurster K, Lenski M, Reichel C
Solid-State Electronics, 110, 23, 2015
2 Phosphorus atomic layer doping in SiGe using reduced pressure chemical vapor deposition
Yamamoto Y, Heinemann B, Murota J, Tillack B
Thin Solid Films, 557, 14, 2014
3 The performance improvement evaluation for SiGe-based IR detectors
Kolandouz M, Farniya AA, Ostling M, Radarnson HH
Solid-State Electronics, 62(1), 72, 2011
4 Epitaxial growth of Si:C/Si/SiGe into cavity formed by selective etching of SiGe
Yamamoto Y, Kopke K, Weidner G, Tillack B
Solid-State Electronics, 53(8), 824, 2009
5 Kinetics of epitaxial growth of Si and SiGe films on (110)Si substrates
Sugiyama N, Moriyama Y, Nakaharai S, Tezuka T, Mizuno T, Takagi S
Applied Surface Science, 224(1-4), 188, 2004
6 Emerging silicon-on-nothing (SON) devices technology
Monfray S, Skotnicki T, Fenouillet-Beranger C, Carriere N, Chanemougame D, Morand Y, Descombes S, Talbot A, Dutartre D, Jenny C, Mazoyer P, Palla R, Leverd F, Le Friec Y, Pantel R, Borel S, Louis D, Buffet N
Solid-State Electronics, 48(6), 887, 2004
7 SiGe(C) epitaxial technologies - issues and prospectives
Grasby TJ, Whall TE, Parker EHC
Thin Solid Films, 412(1-2), 44, 2002
8 Epitaxy and device behaviour of collector-up SiGeHBTs with a partial p-type collector
van den Oever LCM, Nanver LK, Scholtes TLM, van Zeijl HW, van Noort WD, Ren QW, Slotboom JW
Solid-State Electronics, 45(11), 1899, 2001
9 Atomic control of doping during SiGe epitaxy
Tillack B
Thin Solid Films, 318(1-2), 1, 1998