| 1 |
Probing the Nature of Surface Barriers on ZSM-5 by Surface Modification
Ye GH, Guo ZY, Sun YY, Zhu KK, Liu HL, Zhou XG, Coppens MO
Chemie Ingenieur Technik, 89(10), 1333, 2017 |
| 2 |
Effects of controlled SiO2 deposition and phosphorus and nickel doping on surface acidity and diffusivity of medium and small sized HZSM-5 for para-selective alkylation of toluene by methanol
Lu P, Fei ZY, Li L, Feng XZ, Ji WJ, Ding WP, Chen Y, Yang WM, Xie ZK
Applied Catalysis A: General, 453, 302, 2013 |
| 3 |
MD simulations of amorphous SiO2 thin film formation in reactive sputtering deposition processes
Taguchi M, Hamaguchi S
Thin Solid Films, 515(12), 4879, 2007 |
| 4 |
Plasma enhanced chemical vapor deposition of silicon oxide films using TMOS/O-2 gas and plasma diagnostics
Bang SB, Chung TH, Kim Y
Thin Solid Films, 444(1-2), 125, 2003 |
| 5 |
Zn-vapor diffused Er : Yb : LiNbO3 channel waveguides fabricated by means of SiO2 electron cyclotron resonance plasma deposition
Pernas PL, Hernandez MJ, Ruiz E, Cantelar E, Nevado R, Morant C, Lifante G, Cusso F
Applied Surface Science, 161(1-2), 123, 2000 |
| 6 |
Deposition kinetics of silicon dioxide from tetraethylorthosilicate by PECVD
Kim MT
Thin Solid Films, 360(1-2), 60, 2000 |
| 7 |
In situ observation of behavior of organosilicon molecules in low-temperature plasma enhanced CVD
Inoue Y, Sugimura H, Takai O
Thin Solid Films, 345(1), 90, 1999 |
