검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Effects of hydrogen plasma pretreatment on characteristics of copper film deposited by remote plasma CVD using (hfac)Cu(TMVS) Lee JH, Lee JH, Hwang KJ, Kim JY, Suk CG, Choi SY Thin Solid Films, 375(1-2), 132, 2000 |
| 2 |
Effect of O-2 addition on the deposition of Pt thin films by metallorganic chemical vapor deposition Lee JM, Hwang CS, Cho HJ, Suk CG, Kim HJ Journal of the Electrochemical Society, 145(3), 1066, 1998 |
| 3 |
Preparation of high quality RuO2 electrodes for high dielectric thin films by low pressure metal organic chemical vapor deposition Lee JM, Shin JC, Hwang CS, Kim HJ, Suk CG Journal of Vacuum Science & Technology A, 16(5), 2768, 1998 |