| 1 |
An investigation of the adducts of sulfur tetrafluoride (SF4) with BF3, AsF5, and SbF5
Du HC, Wu JP, Cui X
Molecular Crystals and Liquid Crystals, 664(1), 24, 2018 |
| 2 |
Innovative reductive remediation of carbon tetrafluoride at room temperature by using electrogenerated Co1+
Muthuraman G, Moon IS
Journal of Hazardous Materials, 325, 157, 2017 |
| 3 |
Hydrogen Reduction of Germanium Tetrafluoride in RF-Discharge
Kornev RA, Sennikov PG
Plasma Chemistry and Plasma Processing, 35(6), 1111, 2015 |
| 4 |
Hydrophobic treatment on polymethylmethacrylate surface by nanosecond-pulse DBDs in CF4 at atmospheric pressure
Zhang C, Zhou Y, Shao T, Xie Q, Xu JY, Yang WJ
Applied Surface Science, 311, 468, 2014 |
| 5 |
Deposition of microcrystalline silicon in electron-cyclotron resonance discharge (24 GHz) plasma from silicon tetrafluoride precursor
Mansfeld DA, Vodopyanov AV, Golubev SV, Sennikov PG, Mochalov LA, Andreev BA, Drozdov YN, Drozdov MN, Shashkin VI, Bulkine P, Cabarrocas PRI
Thin Solid Films, 562, 114, 2014 |
| 6 |
Reactive high power impulse magnetron sputtering of CFx thin films in mixed Ar/C4F4 and Ar/C4F8 discharges
Schmidt S, Goyenola C, Gueorguiev GK, Jensen J, Greczynski G, Ivanov IG, Czigany Z, Hultman L
Thin Solid Films, 542, 21, 2013 |
| 7 |
Dry etching characteristics of TiN thin films in CF4/BCl3/N-2 plasma
Joo YH, Woo JC, Kim CI
Thin Solid Films, 520(6), 2339, 2012 |
| 8 |
Design of a moving bed reactor for the production of uranium tetrafluoride based on mathematical modeling
Niksiar A, Rahimi A
Chemical Engineering Science, 65(10), 3147, 2010 |
| 9 |
Formation of PTFE-like films in CF4 microwave plasmas
Quade A, Polak M, Schroder K, Ohl A, Weltmann KD
Thin Solid Films, 518(17), 4835, 2010 |
| 10 |
Kinematic viscosity and speed of sound in gaseous CO, CO2, SiF4, SF6, C4F8, and NH3 from 220 K to 375 K and pressures up to 3.4 MPa
Estrada-Alexanders AF, Hurly JJ
Journal of Chemical Thermodynamics, 40(2), 193, 2008 |
