검색결과 : 8건
| No. | Article |
|---|---|
| 1 |
Oxygen incorporated during deposition determines the crystallinity of magnetron-sputtered Ta3N5 films Rudolph M, Vickridge I, Foy E, Alvarez J, Kleider JP, Stanescu D, Magnan H, Herlin-Boime N, Bouchet-Fabre B, Minea T, Hugon MC Thin Solid Films, 685, 204, 2019 |
| 2 |
Structure dependent resistivity and dielectric characteristics of tantalum oxynitride thin films produced by magnetron sputtering Cristea D, Crisan A, Cretu N, Borges J, Lopes C, Cunha L, Ion V, Dinescu M, Barradas NP, Alves E, Apreutesei M, Munteanu D Applied Surface Science, 354, 298, 2015 |
| 3 |
Composition and structure variation for magnetron sputtered tantalum oxynitride thin films, as function of deposition parameters Cristea D, Patru M, Crisan A, Munteanu D, Craciun D, Barradas NP, Alves E, Apreutesei M, Moura C, Cunha L Applied Surface Science, 358, 508, 2015 |
| 4 |
Development of tantalum oxynitride thin films produced by PVD: Study of structural stability Cristea D, Crisan A, Barradas NP, Alves E, Moura C, Vaz F, Cunha L Applied Surface Science, 285, 19, 2013 |
| 5 |
The resistive switching characteristics in TaON films for nonvolatile memory applications Chen MC, Chang TC, Chiu YC, Chen SC, Huang SY, Chang KC, Tsai TM, Yang KH, Sze SM, Tsai MJ Thin Solid Films, 528, 224, 2013 |
| 6 |
Structures and photocatalytic behavior of tantalum-oxynitride thin films Hsieh JH, Li C, Liang HC Thin Solid Films, 519(15), 4699, 2011 |
| 7 |
Multi-technique characterization of tantalum oxynitride films prepared by reactive direct current magnetron sputtering Venkataraj S, Kittur H, Drese R, Wuttig M Thin Solid Films, 514(1-2), 1, 2006 |
| 8 |
Optical characteristics of sputtered tantalum oxynitride Ta(N,O) films Jong CA, Chin TS Materials Chemistry and Physics, 74(2), 201, 2002 |