검색결과 : 2건
No. | Article |
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1 |
In situ physical vapor deposition of ionized Ti and TiN thin films using hollow cathode magnetron plasma source D'Couto GC, Tkach G, Ashtiani KA, Hartsough L, Kim E, Mulpuri R, Lee DB, Levy K, Fissel M, Choi S, Choi SM, Lee HD, Kang HK Journal of Vacuum Science & Technology B, 19(1), 244, 2001 |
2 |
Collimated Ti/Tin Contact and Barrier Layers for Sub 0.5 Mu-M CVD W-Filled Contact Holes Biberger M, Jackson S, Tkach G, Schlueter J, Jones B, Huang CK, Ouellet L Thin Solid Films, 270(1-2), 522, 1995 |