화학공학소재연구정보센터
검색결과 : 7건
No. Article
1 Structural variation of thin films deposited from Zn3In2O6 target by RF-sputtering
Ushiro T, Tsuji D, Fukushima A, Moriga T, Nakabayashi I, Murayama K, Tominaga K
Materials Research Bulletin, 36(5-6), 1075, 2001
2 Effect of insertion of thin ZnO layer in transparent conductive ZnO : Al film
Tominaga K, Murayama T, Mori I, Ushiro T, Moriga T, Nakabayashi I
Thin Solid Films, 386(2), 267, 2001
3 Properties of films of multilayered ZnO : Al and ZnO deposited by an alternating sputtering method
Tominaga K, Murayama T, Umezu N, Mori I, Ushiro T, Moriga T, Nakabayashi I
Thin Solid Films, 343-344, 160, 1999
4 Properties of ZnO : In film prepared by sputtering of facing ZnO : In and Zn targets
Tominaga K, Umezu N, Mori I, Ushiro T, Moriga T, Nakabayashi I
Journal of Vacuum Science & Technology A, 16(3), 1213, 1998
5 Effects of UV light irradiation and excess Zn addition on ZnO : Al film properties in sputtering process
Tominaga K, Umezu N, Mori I, Ushiro T, Moriga T, Nakabayashi I
Thin Solid Films, 316(1-2), 85, 1998
6 Transparent conductive ZnO film preparation by alternating sputtering of ZnO : Al and Zn or Al targets
Tominaga K, Umezu N, Mori I, Ushiro T, Moriga T, Nakabayashi I
Thin Solid Films, 334(1-2), 35, 1998
7 Film Properties of ZnO-Al Prepared by Cosputtering of ZnO-Al and Either Zn or Al Targets
Tominaga K, Manabe H, Umezu N, Mori I, Ushiro T, Nakabayashi I
Journal of Vacuum Science & Technology A, 15(3), 1074, 1997