검색결과 : 7건
No. | Article |
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1 |
Structural variation of thin films deposited from Zn3In2O6 target by RF-sputtering Ushiro T, Tsuji D, Fukushima A, Moriga T, Nakabayashi I, Murayama K, Tominaga K Materials Research Bulletin, 36(5-6), 1075, 2001 |
2 |
Effect of insertion of thin ZnO layer in transparent conductive ZnO : Al film Tominaga K, Murayama T, Mori I, Ushiro T, Moriga T, Nakabayashi I Thin Solid Films, 386(2), 267, 2001 |
3 |
Properties of films of multilayered ZnO : Al and ZnO deposited by an alternating sputtering method Tominaga K, Murayama T, Umezu N, Mori I, Ushiro T, Moriga T, Nakabayashi I Thin Solid Films, 343-344, 160, 1999 |
4 |
Properties of ZnO : In film prepared by sputtering of facing ZnO : In and Zn targets Tominaga K, Umezu N, Mori I, Ushiro T, Moriga T, Nakabayashi I Journal of Vacuum Science & Technology A, 16(3), 1213, 1998 |
5 |
Effects of UV light irradiation and excess Zn addition on ZnO : Al film properties in sputtering process Tominaga K, Umezu N, Mori I, Ushiro T, Moriga T, Nakabayashi I Thin Solid Films, 316(1-2), 85, 1998 |
6 |
Transparent conductive ZnO film preparation by alternating sputtering of ZnO : Al and Zn or Al targets Tominaga K, Umezu N, Mori I, Ushiro T, Moriga T, Nakabayashi I Thin Solid Films, 334(1-2), 35, 1998 |
7 |
Film Properties of ZnO-Al Prepared by Cosputtering of ZnO-Al and Either Zn or Al Targets Tominaga K, Manabe H, Umezu N, Mori I, Ushiro T, Nakabayashi I Journal of Vacuum Science & Technology A, 15(3), 1074, 1997 |