검색결과 : 11건
| No. | Article |
|---|---|
| 1 |
딥러닝을 이용한 육불화텅스텐(WF6) 제조 공정의 지능형 영상 감지 시스템 구현 손승용, 김영목, 최두현 Korean Journal of Materials Research, 31(12), 719, 2021 |
| 2 |
W delta doping in Si(100) using ultraclean low-pressure CVD Kanaya T, Sakuraba M, Murota J Applied Surface Science, 212, 684, 2003 |
| 3 |
Influence of deposition parameters on the texture of chemical vapor deposited tungsten films by a WF6/H-2/Ar gas source Chang IS, Hon MH Journal of the Electrochemical Society, 145(9), 3235, 1998 |
| 4 |
Growth characteristics and electrical resistivity of chemical vapor-deposited tungsten film Chang IS, Hon MH Thin Solid Films, 333(1-2), 108, 1998 |
| 5 |
Interactive effects in reactive ion etching of W1-xGex van der Drift E, Dinh BQ, Verhoeven PA, Fakkeldij EJM, Zuiddam MR, Zijlstra T Journal of Vacuum Science & Technology B, 15(6), 2676, 1997 |
| 6 |
The Effect of Doping Atoms on the Kinetics of Self-Limiting Tungsten Film Growth on Silicon by Reduction of Tungsten Hexafluoride Vanderjeugd CA, Leusink GJ, Oosterlaken TG, Jongste JF, Janssen GC, Radelaar S Journal of the Electrochemical Society, 142(4), 1326, 1995 |
| 7 |
Effect of Carrier Gases on the Chemical-Vapor-Deposition of Tungsten from Wf6-SiH4 Choi HS, Rhee SW Journal of the Electrochemical Society, 141(2), 475, 1994 |
| 8 |
High-Selectivity and High-Deposition Rate Tungsten CVD Freed from Chamber Cleaning Maeda Y, Suzuki H, Sakoh T, Morita K, Morita M, Ohmi T Journal of the Electrochemical Society, 141(2), 566, 1994 |
| 9 |
On the Formation of Defects and Morphology During Chemical-Vapor-Deposition of Tungsten Wang JT, Cao CB, Wang H, Zhang SL Journal of the Electrochemical Society, 141(8), 2192, 1994 |
| 10 |
Nucleation on SiO2 During the Selective Chemical-Vapor-Deposition of Tungsten by the Hydrogen Reduction of Tungsten Hexafluoride Desatnik N, Thompson BE Journal of the Electrochemical Society, 141(12), 3532, 1994 |