화학공학소재연구정보센터
검색결과 : 6건
No. Article
1 Plasma substrate interaction effects on composition and chemical structure of reactively r.f. magnetron sputtered carbon nitride films
Kaltofen R, Sebald T, Schulte J, Weise G
Thin Solid Films, 347(1-2), 31, 1999
2 Preparation, Structure and Properties of Mosx Films
Weise G, Mattern N, Hermann H, Teresiak A, Bacher I, Bruckner W, Bauer HD, Vinzelberg H, Reiss G, Kreissig U, Mader M, Markschlager P
Thin Solid Films, 298(1-2), 98, 1997
3 Low-energy ion bombardment effects in reactive rf magnetron sputtering of carbon nitride films
Kaltofen R, Sebald T, Weise G
Thin Solid Films, 308-309, 118, 1997
4 Development of Mechanical-Stress in Sputtered Cr3Si Films During Annealing
Bruckner W, Weise G, Mattern N, Reiss G
Journal of Materials Science Letters, 15(22), 1935, 1996
5 Plasma Diagnostic Studies to the Carbon Nitride Film Deposition by Reactive RF Magnetron Sputtering
Kaltofen R, Sebald T, Weise G
Thin Solid Films, 290-291, 112, 1996
6 X-Ray-Diffraction Studies of the Structure of Molybdenum Sulfide Thin-Films
Doyle SE, Mattern N, Pitschke W, Weise G, Kraut D, Bauer HD
Thin Solid Films, 245(1-2), 255, 1994