검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Experimental determination of image placement accuracy in extreme ultraviolet lithography Raghunathan S, Wood O, Vukkadala P, Engelstad R, Hartley JG Journal of Vacuum Science & Technology B, 27(6), 2905, 2009 |
| 2 |
Extreme ultraviolet lithography: From research to manufacturing La Fontaine B, Deng Y, Kim RH, Levinson HJ, Okoroanyanwu U, Sandberg R, Wallow T, Wood O Journal of Vacuum Science & Technology B, 25(6), 2089, 2007 |
| 3 |
Are extreme ultraviolet resists ready for the 32 nm node? Petrillo K, Wei Y, Brainard R, Denbeaux G, Goldfarb D, Koay CS, Mackey J, Montgomery W, Pierson W, Wallow T, Wood O Journal of Vacuum Science & Technology B, 25(6), 2490, 2007 |