검색결과 : 17건
| No. | Article |
|---|---|
| 1 |
Evaluation of each electron beam and exposure results with four column cells in multicolumn e-beam exposure system Yamada A, Yasuda H, Yamabe M Journal of Vacuum Science & Technology B, 27(6), 2518, 2009 |
| 2 |
A unique phase behavior of random copolymer of N-isopropylacrylamide and N,N-diethylacrylamide in water Maeda Y, Yamabe M Polymer, 50(2), 519, 2009 |
| 3 |
Electron beams in individual column cells of multicolumn cell system Yamada A, Yasuda H, Yamabe M Journal of Vacuum Science & Technology B, 26(6), 2025, 2008 |
| 4 |
Influence of Coulomb effects on electron projection lithography process Yamamoto J, Yamashita H, Yamabe M, Admoto H Journal of Vacuum Science & Technology B, 22(6), 2891, 2004 |
| 5 |
Lithographic performance of diamond-like carbon membrane mask in electron projection lithography Yamashita H, Amemiya I, Yamabe M, Arimoto H Journal of Vacuum Science & Technology B, 22(6), 3067, 2004 |
| 6 |
Thermal analysis of diamondlike carbon membrane masks in projection electron-beam lithography Babin S, Butomo V, Kuzmin IY, Yamashita H, Yamabe M Journal of Vacuum Science & Technology B, 22(6), 3082, 2004 |
| 7 |
Complementary exposure of 70 nm SoC devices in electron projection lithography Yamashita H, Amemiya I, Takeuchi K, Masaoka H, Takahashi K, Ikeda A, Kuroki Y, Yamabe M Journal of Vacuum Science & Technology B, 21(6), 2645, 2003 |
| 8 |
Thermal analysis of projection electron beam lithography using complementary mask exposures Babin S, Kuzmin I, Yamashita H, Yamabe M Journal of Vacuum Science & Technology B, 21(6), 2691, 2003 |
| 9 |
Complementary mask pattern split for 8 in stencil masks in electron projection lithography Yamashita H, Takahashi K, Amemiya I, Takeuchi K, Masaoka H, Takenaka H, Yamabe M Journal of Vacuum Science & Technology B, 20(6), 3015, 2002 |
| 10 |
Experimental study of electron beam projection lithography mask defect printability Kojima Y, Katakura N, Tomo Y, Takenaka H, Yoshida A, Shimizu I, Yamabe M Journal of Vacuum Science & Technology B, 19(6), 2474, 2001 |