검색결과 : 1건
No. | Article |
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1 |
Elimination of GeO2 and Ge3N4 interfacial transition regions and defects at n-type Ge interfaces: A pathway for formation of n-MOS devices on Ge substrates Lucovsky G, Lee S, Long JP, Seo H, Luning J Applied Surface Science, 254(23), 7933, 2008 |