1 |
Angular dependence of SiO2 etching in plasmas containing heptafluoropropyl methyl ether Kim JH, Park JS, Kim CK Thin Solid Films, 669, 262, 2019 |
2 |
Excimer laser ablation of graphite: The enhancement of carbon dimer formation Ursu C, Nica P, Focsa C Applied Surface Science, 456, 717, 2018 |
3 |
Electrochemical properties of N-doped hydrogenated amorphous carbon films fabricated by plasma-enhanced chemical vapor deposition methods Tanaka Y, Furuta M, Kuriyama K, Kuwabara R, Katsuki Y, Kondo T, Fujishima A, Honda K Electrochimica Acta, 56(3), 1172, 2011 |
4 |
Hydrogenated amorphous carbon and carbon nitride films deposited at low pressure by plasma enhanced chemical vapor deposition Miyajima Y, Henley SJ, Silva SRP Thin Solid Films, 519(19), 6374, 2011 |
5 |
Effect of H-2 and O-2 plasma etching treatment on the surface of diamond-like carbon thin film Yun DY, Choi WS, Park YS, Hong B Applied Surface Science, 254(23), 7925, 2008 |
6 |
Plasma enhanced chemical vapor deposition of a-C : H films in CH4-CO2 plasma: Gas composition and substrate biasing effects on the film structure and growth process Gottardi G, Laidani N, Bartali R, Micheli V, Anderle M Thin Solid Films, 516(12), 3910, 2008 |
7 |
Adherent amorphous hydrogenated carbon films on metals deposited by plasma enhanced chemical vapor deposition Capote G, Bonetti LF, Santos LV, Trava-Airoldi VJ, Corat EJ Thin Solid Films, 516(12), 4011, 2008 |
8 |
Liquid crystal alignment on the two-directionally processed substrates: Comparison of mechanical rubbing and plasma beam alignment Wu KY, Hwang J, Lee CY, Tang HC, Liu YL, Liu CH, Wei HK, Kou CS Thin Solid Films, 517(2), 905, 2008 |
9 |
Development of diamond-like carbon-coated electrodes for corrosion sensor applications at high temperatures Chiang KT, Yang L, Wei R, Coulter K Thin Solid Films, 517(3), 1120, 2008 |
10 |
Liquid crystal alignment on the a-C : H films by Ar plasma ion immersion Chang SJ, Wu KY, Yang YH, Hwang J, Wu HY, Pan RP, Lee AP, Kou CS Thin Solid Films, 515(20-21), 8000, 2007 |