화학공학소재연구정보센터
검색결과 : 18건
No. Article
1 MOVPE growth and characterization of heteroepitaxial germanium on silicon using iBuGe as precursor
Attolini G, Ponraj JS, Frigeri C, Buffagni E, Ferrari C, Musayeva N, Jabbarov R, Bosi M
Applied Surface Science, 360, 157, 2016
2 Epitaxial growth of Si and SiGe at temperatures lower than 500 degrees C with disilane and germane
Aubin J, Hartmann JM, Benevent V
Thin Solid Films, 602, 36, 2016
3 Reduced-pressure chemical vapor deposition of boron-doped Si and Ge layers
Bogumilowicz Y, Hartmann JM
Thin Solid Films, 557, 4, 2014
4 Fabrication of a-SiGeC:H solar cells using monomethyl germane by suppressing carbon incorporation for narrowing optical bandgap
Kim DY, Yunaz IA, Kasashima S, Miyajima S, Konagai M
Solar Energy Materials and Solar Cells, 95(3), 829, 2011
5 Metal Organic Chemical Vapor Deposition법을 이용한 Germanium 전구체의 증착 특성 연구
김선희, 김봉준, 김도형, 이준기
Korean Journal of Materials Research, 18(6), 302, 2008
6 Deposition and characterization of mu c-Ge1-xCx thin films grown by hot-wire chemical vapor deposition using organo-germane
Yashiki Y, Miyajima S, Yamada A, Konagai M
Thin Solid Films, 501(1-2), 202, 2006
7 Epitaxy solutions for Ge MOS technology
Leys FE, Bonzom R, Loo R, Richard O, De Jaeger B, Van Steenbergen J, Dessein K, Conard T, Rip J, Bender H, Vandervorst W, Meuris M, Caymax M
Thin Solid Films, 508(1-2), 292, 2006
8 Interactions of germanium atoms with silica surfaces
Stanley SK, Coffee SS, Ekerdt JG
Applied Surface Science, 252(4), 878, 2005
9 First principles total energy studies of the adsorption of germane on Ge(001)-c(2x4)
Cocoletzi GH, Hernandez PH, Takeuchi N
Thin Solid Films, 490(2), 196, 2005
10 GeH4 adsorption on Si(001) at RT: transfer of H atoms to Si sites and atomic exchange between Si and Ge
Murata T, Suemitsu M
Applied Surface Science, 224(1-4), 179, 2004