검색결과 : 2건
No. | Article |
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1 |
Deposition of device quality silicon nitride with ultra high deposition rate (> 7 nm/s) using hot-wire CVD Verlaan V, Houweling ZS, van der Werf CHM, Romijn IG, Weeber AW, Goldbach HD, Schropp REI Thin Solid Films, 516(5), 533, 2008 |
2 |
Silicon nitride at high deposition rate by Hot Wire Chemical Vapor Deposition as passivating and antireflection layer on multi crystalline silicon solar cells van der Werf CHM, Goldbach HD, Loffler J, Scarfo A, Kylner AMC, Stannowski B, ArnoldBik WM, Weeber A, Rieffe H, Soppe WJ, Rath JK, Schropp REI Thin Solid Films, 501(1-2), 51, 2006 |