검색결과 : 1건
| No. | Article |
|---|---|
| 1 |
SiGe elevated source/drain structure and nickel silicide contact layer for sub 0.1 mu m MOSFET fabrication Shim J, Oh H, Choi H, Sakaguchi T, Kurino H, Koyanagi M Applied Surface Science, 224(1-4), 260, 2004 |
| No. | Article |
|---|---|
| 1 |
SiGe elevated source/drain structure and nickel silicide contact layer for sub 0.1 mu m MOSFET fabrication Shim J, Oh H, Choi H, Sakaguchi T, Kurino H, Koyanagi M Applied Surface Science, 224(1-4), 260, 2004 |