화학공학소재연구정보센터
검색결과 : 15건
No. Article
1 The effect of Ni:Si ratio on microstructural properties of Ni/Si ohmic contacts to SiC
Wzorek M, Borysiewicz MA, Czerwinski A, Mysliwiec M, Ekielski M, Ratajczak J, Piotrowska A, Katcki J
Applied Surface Science, 369, 535, 2016
2 Nickel silicides prepared from organometallic polymer as efficient catalyst towards hydrogenation of phenylacetylene
Yang KX, Chen X, Guan JC, Liang CH
Catalysis Today, 246, 176, 2015
3 Growth and structural property studies on NiSi/SiC core-shell nanowires by hot-wire chemical vapor deposition
Nazarudin NFFB, Azizan SNAB, Rahman SA, Goh BT
Thin Solid Films, 570, 243, 2014
4 Raman study of Ni and Ni silicide contacts on 4H-and 6H-SiC
Cichon S, Machac P, Barda B, Machovic V, Slepicka P
Thin Solid Films, 520(13), 4378, 2012
5 Experimental and theoretical positron annihilation studies on bulk nickel silicides
Abhaya S, Rajaraman R, Amarendra G
Applied Surface Science, 255(1), 142, 2008
6 Silicidation in Ni/Si thin film system investigated by X-ray diffraction and Auger electron spectroscopy
Abhaya S, Amarendra G, Kalavathi S, Gopalan P, Kamruddin M, Tyagi AK, Sastry VS, Sundar CS
Applied Surface Science, 253(8), 3799, 2007
7 Phase formation at rapid thermal annealing of nickel contacts on C-face n-type 4H-SiC.
Ferrero S, Albonico A, Meotto UM, Rombola G, Porro S, Giorgis F, Perrone D, Scaltrito L, Bontempi E, Depero LE, Richieri G, Merlin L
Materials Science Forum, 483, 733, 2005
8 In-line phase and texture control in microelectronics industry
Kozaczek K
Materials Science Forum, 495-497, 1343, 2005
9 Lateral growth and three-dimensional effects in contacts between NiSi0.82Ge0.18 and p(+)-Si0.82Ge0.18
Persson S, Isheden C, Jarmar T, Zhang SL
Thin Solid Films, 489(1-2), 159, 2005
10 Enhanced phase stability and morphological stability of Ni(Si,Ge) on strained Si0.8Ge0.2
Seger J, Zhang SL
Thin Solid Films, 429(1-2), 216, 2003