화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Atomic layer deposition and characterization of stoichiometric erbium oxide thin dielectrics on Si(100) using (CpMe)(3)Er precursor and ozone
Xu RS, Tao Q, Yang Y, Takoudis CG
Applied Surface Science, 258(22), 8514, 2012
2 UV assisted low temperature nitridation and post deposition oxidation technique for hafnium oxide gate dielectric
Son SY, Jang JH, Kumar P, Ramani K, Craciun V, Singh RK
Applied Surface Science, 254(21), 7087, 2008
3 Pulsed laser deposition of oxide gate dielectrics for pentacene organic field-effect transistors
Yaginuma S, Yamaguchi J, Itaka K, Koinuma H
Thin Solid Films, 486(1-2), 218, 2005
4 Effects of O-2/N2O-plasma treatment on nitride films on strained Si
Bera LK, Senapati B, Maikap S, Maiti CK
Solid-State Electronics, 44(9), 1533, 2000