화학공학소재연구정보센터
검색결과 : 18건
No. Article
1 Step-growth thiol-thiol photopolymerization as radiation curing technology
Feillee N, De Fina M, Ponche A, Vaulot C, Rigolet S, Jacomine L, Majjad H, Ley C, Chemtob A
Journal of Polymer Science Part A: Polymer Chemistry, 55(1), 117, 2017
2 Design of novel photobase generators upon violet LEDs and use in photopolymerization reactions
Bouzrati-Zerelli M, Frigoli M, Dumur F, Graff B, Fouassier JP, Lalevee J
Polymer, 124, 151, 2017
3 UV-curable thio-ether-urethane network with tunable properties
Perrot D, Croutxe-Barghorn C, Allonas X
Journal of Polymer Science Part A: Polymer Chemistry, 54(19), 3119, 2016
4 Photobase Generators Derived from trans-o-Coumaric Acid for Anionic UV Curing Systems without Gas Generation
Arimitsu K, Takemori Y, Nakajima A, Oguri A, Furutani M, Gunji T, Abe Y
Journal of Polymer Science Part A: Polymer Chemistry, 53(10), 1174, 2015
5 Photo-induced aminobenzoate group formation on a polymeric photobase generator bearing N-phenylcarbamate groups and its application to color imaging material
Chae KH, Yang UC, Lee MK
Polymer, 55(10), 2362, 2014
6 Photoinduced depolymerization of poly(olefin sulfone)s possessing photobase generator side-chains: Effect of spacer-chain length
Sasaki T, Yoneyama T, Hashimoto S, Takemura S, Naka Y
Journal of Polymer Science Part A: Polymer Chemistry, 51(18), 3873, 2013
7 Recent progress in negative-working photosensitive and thermally stable polymers
Higashihara T, Saito Y, Mizoguchi K, Ueda M
Reactive & Functional Polymers, 73(2), 303, 2013
8 Photo-crosslinking of polymeric photobase generator bearing O-acyloxime moieties with low eliminating by-products and high sensitivity
Suyama K, Ozaki S, Shirai M
Reactive & Functional Polymers, 73(3), 518, 2013
9 Photoinduced depolymerization in poly(olefin sulfone) films comprised of volatile monomers doped with a photobase generator
Sasaki T, Kondo T, Noro M, Saida K, Yaguchi H, Naka Y
Journal of Polymer Science Part A: Polymer Chemistry, 50(8), 1462, 2012
10 Low-CTE Photosensitive Polyimide Based on Semialicyclic Poly(amic acid) and Photobase Generator
Ogura T, Higashihara T, Ueda M
Journal of Polymer Science Part A: Polymer Chemistry, 48(6), 1317, 2010