검색결과 : 18건
No. | Article |
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1 |
Step-growth thiol-thiol photopolymerization as radiation curing technology Feillee N, De Fina M, Ponche A, Vaulot C, Rigolet S, Jacomine L, Majjad H, Ley C, Chemtob A Journal of Polymer Science Part A: Polymer Chemistry, 55(1), 117, 2017 |
2 |
Design of novel photobase generators upon violet LEDs and use in photopolymerization reactions Bouzrati-Zerelli M, Frigoli M, Dumur F, Graff B, Fouassier JP, Lalevee J Polymer, 124, 151, 2017 |
3 |
UV-curable thio-ether-urethane network with tunable properties Perrot D, Croutxe-Barghorn C, Allonas X Journal of Polymer Science Part A: Polymer Chemistry, 54(19), 3119, 2016 |
4 |
Photobase Generators Derived from trans-o-Coumaric Acid for Anionic UV Curing Systems without Gas Generation Arimitsu K, Takemori Y, Nakajima A, Oguri A, Furutani M, Gunji T, Abe Y Journal of Polymer Science Part A: Polymer Chemistry, 53(10), 1174, 2015 |
5 |
Photo-induced aminobenzoate group formation on a polymeric photobase generator bearing N-phenylcarbamate groups and its application to color imaging material Chae KH, Yang UC, Lee MK Polymer, 55(10), 2362, 2014 |
6 |
Photoinduced depolymerization of poly(olefin sulfone)s possessing photobase generator side-chains: Effect of spacer-chain length Sasaki T, Yoneyama T, Hashimoto S, Takemura S, Naka Y Journal of Polymer Science Part A: Polymer Chemistry, 51(18), 3873, 2013 |
7 |
Recent progress in negative-working photosensitive and thermally stable polymers Higashihara T, Saito Y, Mizoguchi K, Ueda M Reactive & Functional Polymers, 73(2), 303, 2013 |
8 |
Photo-crosslinking of polymeric photobase generator bearing O-acyloxime moieties with low eliminating by-products and high sensitivity Suyama K, Ozaki S, Shirai M Reactive & Functional Polymers, 73(3), 518, 2013 |
9 |
Photoinduced depolymerization in poly(olefin sulfone) films comprised of volatile monomers doped with a photobase generator Sasaki T, Kondo T, Noro M, Saida K, Yaguchi H, Naka Y Journal of Polymer Science Part A: Polymer Chemistry, 50(8), 1462, 2012 |
10 |
Low-CTE Photosensitive Polyimide Based on Semialicyclic Poly(amic acid) and Photobase Generator Ogura T, Higashihara T, Ueda M Journal of Polymer Science Part A: Polymer Chemistry, 48(6), 1317, 2010 |