검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Formation of Positive- and Negative-tone Patterns of Poly(lactic acid) by Reaction Development Patterning Oyama T, Kawada T, Tokoro Y Chemistry Letters, 46(12), 1810, 2017 |
| 2 |
Lithographic design of photosensitive polyarylates based on reaction development patterning Oyama T, Kitamura A, Sato E, Tomoi M Journal of Polymer Science Part A: Polymer Chemistry, 44(8), 2694, 2006 |
| 3 |
Photosensitive fluorinated polyimides with constant based on reaction development a low dielectric patterning Miyagawa T, Fukushima T, Oyama T, Iijima T, Tomoi M Journal of Polymer Science Part A: Polymer Chemistry, 41(6), 861, 2003 |
| 4 |
Photosensitive polyarylates based on reaction development patterning Oyama T, Kitamura A, Fukushima T, Iijima T, Tomoi M Macromolecular Rapid Communications, 23(2), 104, 2002 |