화학공학소재연구정보센터
검색결과 : 14건
No. Article
1 Internal photoemission study on charge trapping behavior in rapid thermal oxides on strained-Si/SiGe heterolayers
Bera MK, Mahata C, Bhattacharya S, Chakraborty AK, Armstrong BM, Gamble HS, Maiti CK
Applied Surface Science, 255(5), 2971, 2008
2 Stress-relaxation mechanism in ultra-thin SiGe on insulator formed by H(+) irradiation-assisted Ge condensation method
Tanaka M, Kenjo A, Sadoh T, Miyao M
Thin Solid Films, 517(1), 248, 2008
3 Comprehensive study of low temperature (< 1000 degrees C) oxidation process in SiGe/SOI structures
Tanaka M, Ohka T, Sadoh T, Miyao M
Thin Solid Films, 517(1), 251, 2008
4 Thickness-dependent stress-relaxation in thin SGOI structures and its improvement
Tanaka M, Tsunoda S, Sadoh T, Enokida T, Ninomiya M, Nakamae M, Miyao M
Thin Solid Films, 508(1-2), 247, 2006
5 Local wet-oxidation characteristic of strained-Si/SiGe-on-insulator
Nishisaka M, Shirata O, Sakamoto D, Enokida T, Hagino H, Asano T
Thin Solid Films, 508(1-2), 256, 2006
6 Characterization of As+ ion-implanted layers in strained-Si/SiGe/Si hetero-structures
Ishida T, Irieda S, Inada T, Sugii N
Applied Surface Science, 224(1-4), 82, 2004
7 Simulation and modelling of transport properties in strained-Si and strained-Si/SiGe-on-insulator MOSFETs
Roldan JB, Gamiz F
Solid-State Electronics, 48(8), 1347, 2004
8 Investigation of strained Si/SiGe devices by MC simulation
Jungemann C, Subba N, Goo JS, Riecobene C, Xiang Q, Meinerzhagen B
Solid-State Electronics, 48(8), 1417, 2004
9 Large-signal modelling including low-frequency dispersion of n-channel SiGe MODFETs and MMIC applications
Kallfass I, Brazil TJ, OhAnnaidh B, Abele P, Hackbarth T, Zeuner M, Konig U, Schumacher H
Solid-State Electronics, 48(8), 1433, 2004
10 Impact of virtual substrate quality on performance enhancements in strained Si/SiGe heterojunction n-channel MOSFETs
Olsen SH, O'Neill AG, Norris DJ, Cullis AG, Fobelets K, Kemhadjian HA
Solid-State Electronics, 47(8), 1289, 2003