1 - 5 |
A Polymer Electrolyte-Based Rechargeable Lithium/Oxygen Battery Abraham KM, Jiang Z |
6 - 12 |
A New Class of Advanced Polymer Electrolytes and Their Relevance in Plastic-Like, Rechargeable Lithium Batteries Appetecchi GB, Dautzenberg G, Scrosati B |
13 - 17 |
Improvements of the Rechargeable Alkaline MnO2-Zn Cell Binder L, Kordesch K, Urdl P |
18 - 23 |
Crystallite Size Effects of Carbon-Supported Platinum on Oxygen Reduction in Liquid Acids Tamizhmani G, Dodelet JP, Guay D |
24 - 31 |
Lithium Intercalation of Carbon-Fiber Microelectrodes Verbrugge MW, Koch BJ |
32 - 36 |
Surface Characterization of RuO2-SnO2 Coated Titanium Electrodes Ito M, Murakami Y, Kaji H, Yahikozawa K, Takasu Y |
37 - 43 |
In-Situ Quartz-Crystal Microbalance Studies of Nickel Hydrous Oxide-Films in Alkaline Electrolytes Mo YB, Hwang E, Scherson DA |
44 - 51 |
Reduction of Hexavalent Chromium in Aqueous-Solutions by Polypyrrole .2. Thermodynamic, Kinetic, and Mechanistic Aspects Senthurchelvan R, Wang Y, Basak S, Rajeshwar K |
51 - 58 |
The Synergistic Effect of Hydrogen-Sulfide and Nitrogen-Dioxide on the Atmospheric Corrosion of Zinc Svensson JE, Johansson LG |
58 - 66 |
Corrosion Behavior of Nickel-Iron Alloys in Molten-Carbonate Vossen JP, Janssen AH, Dewit JH |
66 - 73 |
Corrosion Behavior of Chromium in Molten-Carbonate Vossen JP, Makkus RC, Dewit JH |
74 - 83 |
A Model for the Incorporation of Electrolyte Species into Anodic Alumina Wood GC, Skeldon P, Thompson GE, Shimizu K |
83 - 91 |
Development of Surface Impurity Segregation During Dissolution of Aluminum Wu XL, Hebert K |
92 - 96 |
Copper Deposition on HF Etched Silicon Surfaces - Morphological and Kinetic-Studies Chyan OM, Chen JJ, Chien HY, Sees J, Hall L |
97 - 99 |
Preparation of Lead-Zirconium-Titanium Film and Powder by Electrodeposition Bhattacharya RN, Ginley DS |
L1 - L3 |
Wet Chemical Etch Solutions for AlxGa1-Xp Lee JW, Santana CJ, Abernathy CR, Pearton SJ, Ren F |
L4 - L7 |
Improved Graphite Anode for Lithium-Ion Batteries - Chemically Bonded Solid-Electrolyte Interface and Nanochannel Formation Peled E, Menachem C, Bartow D, Melman A |
L7 - L9 |
A New Fuel-Cell Electrocatalyst Based on Highly Porous Carbonized Polyacrylonitrile Foam with Very-Low Platinum Loading Ye SY, Vijh AK, Dao LH |
100 - 114 |
Synthesis and Characterization of Li1+xmn2-xO4 for Li-Ion Battery Applications Gao Y, Dahn JR |
114 - 119 |
The Effect of Various Naturally-Occurring Metal-Binding Compounds on the Electrochemical-Behavior of Aluminum Hansen DC, Mccafferty E |
120 - 124 |
Studies of Metal Hydride Electrodes Using an Electrochemical Quartz-Crystal Microbalance Li Y, Cheng YT |
124 - 130 |
Porous Nickel Oxide/Nickel Films for Electrochemical Capacitors Liu KC, Anderson MA |
130 - 138 |
Electrodeposition of Nickel-Aluminum Alloys from the Aluminum Chloride-1-Methyl-3-Ethylimidazolium Chloride Room-Temperature Molten-Salt Pitner WR, Hussey CL, Stafford GR |
139 - 143 |
Investigation on Copper Corrosion in Thin-Films of Sulfuric-Acid Wagner R |
144 - 147 |
Superprotonic Conductors of Glassy Zirconium-Phosphates Abe Y, Li GM, Nogami M, Kasuga T, Hench LL |
147 - 154 |
Studies of the Formation of Cerium-Rich Protective Films Using X-Ray-Absorption Near-Edge Spectroscopy and Rotating-Disk Electrode Methods Aldykiewicz AJ, Davenport AJ, Isaacs HS |
154 - 159 |
Conductance of Solutions of Lithium Tris(Trifluoromethanesulfonyl) Methide in Water, Acetonitrile, Propylene Carbonate, N,N-Dimethylformamide, and Nitromethane at 25-Degrees-C Croce F, Daprano A, Nanjundiah C, Koch VR, Walker CW, Salomon M |
159 - 169 |
Capacitive Deionization of NaCl and NaNO3 Solutions with Carbon Aerogel Electrodes Farmer JC, Fix DV, Mack GV, Pekala RW, Poco JF |
170 - 174 |
Electrochemical and Spectroscopic Studies of Ytterbium in the Aluminum Chloride-1-Methyl-3-Ethylimidozolium Chloride Room-Temperature Molten-Salt Gau WJ, Sun IW |
175 - 178 |
A Study of the Transport of Formaldehyde and Ethylene-Glycol Through Ion Permeable Membranes in Electrolytic Cells Genders JD, George EL, Pletcher D |
178 - 182 |
The Spinel Phases Lim(Y)Mn(2-Y)O(4) (M=co,Cr,Ni) as the Cathode for Rechargeable Lithium Batteries Li GH, Ikuta H, Uchida T, Wakihara M |
183 - 189 |
Structure, H-1-NMR Spectra, Thermodynamics, and Transport-Properties of Molten-Salt Solutions .1. 4-Methylpyridinium Chloride and 4-Methylpyridinium Iodine Newman DS, Potter M, Fang L, Davy R, Parker F |
189 - 197 |
Preparation and Characterization of Fine-Grain Yttrium-Based Phosphors by Sol-Gel Process Rao RP |
197 - 202 |
Convective Diffusion to a Microdisk Sensor Subject to Uniform Shear-Flow Verbrugge MW, Baker DR |
203 - 209 |
Physicochemical Properties of SnO2-Sb2O5 Films Prepared by the Spray-Pyrolysis Technique Correalozano B, Comninellis C, Debattisti A |
210 - 215 |
A Dislocation Formation Model of Trench-Induced Dislocations in Dynamic Random-Access Memories Dellith M, Booker GR, Kolbesen BO, Bergholz W, Gelsdorf F |
216 - 220 |
Identification Possibility of Metallic Impurities in P-Type Silicon by Lifetime Measurement Horanyi TS, Tutto P, Kovacsics C |
221 - 228 |
A Study of Nitrogen Incorporation During the Oxidation of Si(100) in N2O at High-Temperatures Hussey RJ, Hoffman TL, Tao Y, Graham MJ |
228 - 232 |
Al-Ge Reflow Sputtering for Submicron Contact Hole Filling Kikuta K, Kikkawa T |
233 - 237 |
Improvement of High-Temperature Water Rinsing and Drying for HF-Last Wafer Cleaning Li L, Bender H, Zou G, Mertens PW, Meuris MA, Heyns MM |
237 - 244 |
Ultraviolet Depth Lithography and Galvanoforming for Micromachining Lochel B, Maciossek A, Quenzer HJ, Wagner B |
244 - 251 |
Investigations on High-Temperature Thermal-Oxidation Process at Top and Bottom Interfaces of Top Silicon of Simox Wafers Nakashima S, Katayama T, Miyamura Y, Matsuzaki A, Kataoka M, Ebi D, Imai M, Izumi K, Ohwada N |
251 - 257 |
Formation Mechanism and Anticorrosive Properties of Thin Siloxane Films on Metal-Surfaces Petrunin MA, Nazarov AP, Mikhailovski YN |
258 - 263 |
Methodology for the Certification of Reference Specimens for Determination of Oxygen Concentration in Semiconductor Silicon by Infrared Spectrophotometry Rennex BG, Ehrstein JR, Scace RI |
264 - 266 |
Electron-Cyclotron-Resonance Plasma-Etching of Native TiO2 on Tin Day ME, Delfino M |
266 - 271 |
Adsorption of Chlorine on TiSi2 - Application to Etching and Deposition of Silicide Films Ditchfield R, Mendicino MA, Seebauer EG |
271 - 277 |
Rapid Thermal Annealing Behavior of Amorphous SiC Layers Deposited by Electron-Cyclotron-Resonance Plasma Gomez FJ, Garrido J, Martinez J, Piqueras J |
277 - 283 |
Effect of Temperature on the Interaction of Silicon with Nonionic Surfactants in Alkaline-Solutions Jeon JS, Raghavan S, Carrejo JP |
283 - 287 |
Fluorine-Doped Tin Dioxide Thin-Films Prepared by Radiofrequency Magnetron Sputtering Maruyama T, Akagi H |
288 - 292 |
Optimization of a Low Damage, High-Resolution Etch Process for Sinx in an ECR Reactor Olson RJ, Kazior TE, Lane B, Holber WM, Bourget L |
292 - 296 |
A Reverse Monte-Carlo Modeling Study of Diamond-Like Carbon Rigden JS, Newport RJ |
296 - 302 |
Batch Reactor Kinetic-Studies of Tungsten LPCVD from Silane and Tungsten Hexafluoride Bell DA, Mcconica CM, Baker KL, Kuchta E |
302 - 305 |
Electron-Spectroscopy for Chemical-Analysis of Cool White Phosphors Coated with SiO2 Thin-Film Dang TA, Chau CN |
305 - 314 |
Morphology and Strongly Enhanced Photoresponse of Gap Electrodes Made Porous by Anodic Etching Erne BH, Vanmaekelbergh D, Kelly JJ |
315 - 325 |
Electromodulation of Luminescence in Organic Photoconductors Kalinowski J, Stampor W, Dimarco P |
326 - 329 |
Effect of Electrochemical Polarization on Optical-Properties of Sputter-Prepared Tin Nitride in Aqueous-Electrolyte Maruyama T, Osaki Y |
330 - 333 |
The Intermediate Role of the Gd3+ Ions in the Efficiency of the Host-Sensitized Luminescence in the Lanthanum Metaborate Host Lattice Mayolet A, Zhang W, Martin P, Chassigneux B, Krupa JC |
334 - 339 |
Internal Cation Mobilities in the Molten Binary-Systems (Y,La)Cl-3 and (Y,Dy)Cl-3 Matsuura H, Okada I, Iwadate Y, Mochinaga J |
339 - 346 |
Low-Background Instrumental Neutron-Activation Analysis of Silicon Semiconductor-Materials Smith AR, Mcdonald RJ, Manini H, Hurley DL, Norman EB, Vella MC, Odom RW |
347 - 352 |
Conducting and Charge-Trapping Defects in Buried Oxide Layers of Simox Structures Afanasev VV, Brown GA, Hughes HL, Liu ST, Revesz AG |
352 - 355 |
Nitridation-Retarded Diffusion of Phosphorus in (100)Silicon Chen NK, Lee C |
356 - 360 |
Electrical Characteristics of Postoxidation Annealed Very Thin SiO2-Films - Potential Benefits of Rapid Thermal-Processing Fonseca L, Campabadal F |
361 - 362 |
Contribution of Diffusion Interstitial Injection to Gettering of Metallic Impurities in Silicon Gaiseanu F, Schroter W |
363 - 367 |
Low-Pressure Chemical-Vapor-Deposition of Si1-xGex Films Using Si2H6 and GeH4 Source Gases Kim JW, Ryu MK, Kim KB, Kim SJ |
368 - 373 |
Conduction and Charge-Trapping Characteristics of MOS Capacitors with Oxidized Nitride Films of Different Nitride Thicknesses Under Positive Stress Bias Mazumder MK, Kobayashi K, Ogata T, Mitsuhashi J, Mashiko Y, Koyama H |
374 - 381 |
Thermal-Model Validation for Rapid Thermal Chemical-Vapor-Deposition of Polysilicon Schaper C, Kailath T |
381 - 385 |
Stabilizing Dielectric-Constants of Fluorine-Doped SiO2-Films by N2O-Plasma Annealing Takeishi S, Kudoh H, Shinohara R, Tsukune A, Satoh Y, Harada H, Yamada M |
385 - 390 |
Processing of 3-Dimensional Microstructures Using Macroporous N-Type Silicon Ottow S, Lehmann V, Foll H |
L10 - L12 |
Countercation-Sensitive Electrochromism of Cobalt Hexacyanoferrate Films Kulesza PJ, Malik MA, Miecznikowski K, Wolkiewicz A, Zamponi S, Berrettoni M, Marassi R |
L12 - L15 |
High-Performance Direct Methanol Polymer Electrolyte Fuel-Cells Ren XM, Wilson MS, Gottesfeld S |
L15 - L16 |
Oxide-Growth Enhancement Related to Annealing-Induced Arsenic Accumulation in the Si/SiO2 Interface Region Berger HH, Muller B, Jacob K |
L17 - L19 |
Dislocation Etch Pits in GaN Epitaxial Layers Grown on Sapphire Substrates Kozawa T, Kachi T, Ohwaki T, Taga Y, Koide N, Koike M |