Journal of the Electrochemical Society

Journal of the Electrochemical Society, Vol.142, No.7 Entire volume, number list

ISSN: 0013-4651 (Print)

In this Issue (74 articles)

2111 - 2118	In-Situ Electron-Spin-Resonance Study of N-Doping and P-Doping of Polyterthiophene Bandey HL, Cremins P, Garner SE, Hillman AR, Raynor JB, Workman AD
2118 - 2121	Electrochemical Properties of Polyethylene Oxide-Li((Cf3So2)(2)N)-Gamma-LiAlO2 Composite Polymer Electrolytes Borghini MC, Mastragostino M, Passerini S, Scrosati B
2122 - 2125	Electrochemical and Structural Studies of Petroleum Coke in Carbonate-Based Electrolytes Jean M, Desnoyer C, Tranchant A, Messina R
2126 - 2131	Application of Feocl Derivatives for a Secondary Lithium Battery .3. Electrochemical Reaction and Physical State of Reaction-Product of Feocl with Aniline in Water Kanamura K, Sakaebe H, Fujimoto H, Takehara Z
2132 - 2138	Investigation of the Kinetics and Mechanism of Co-Porphyrin Catalyzed Oxygen Reduction by Hydrophobic Carbon-Ceramic Electrodes Tsionsky M, Lev O
2138 - 2143	Novel Li+ Ion Conductors and Mixed Conductors, Li3+xsixcr1-xO4 and a Simple Method for Estimating Li+/E(-) Transport Numbers Sumathipala HH, Dissanayake MA, West AR
2144 - 2148	Growth of Expanded Antimoniol Lead Alloy Battery Grids Tang NY, Valeriote EM
2149 - 2156	Synthesis and Structural Aspects of Limn2O4+/-Delta as a Cathode for Rechargeable Lithium Batteries Yamada A, Miura K, Hinokuma K, Tanaka M
2156 - 2162	High-Surface-Area Electromigration Damage for 3-V Li-Cell Cathodes Kurimoto H, Suzuoka K, Murakami T, Xia YY, Nakamura H, Yoshio M
2162 - 2167	In-Situ Raman-Study of the Corrosion of Zinc-Coated Steel in the Presence of Chloride .1. Characterization and Stability of Zinc Corrosion Products Bernard MC, Hugotlegoff A, Phillips N
2167 - 2170	In-Situ Raman-Study of the Corrosion of Zinc-Coated Steel in the Presence of Chloride .2. Mechanisms of Underpaint Corrosion and Role of the Conversion Layers Bernard MC, Hugotlegoff A, Phillips N
2170 - 2173	Application of a Quartz-Crystal Microbalance to the Study of Copper Corrosion in Acid-Solution Inhibited by Triazole-Iodide Protective Films Jope D, Sell J, Pickering HW, Weil KG
2174 - 2178	Precipitation of Rare-Earth Compounds in LiCl-KCl Eutectic Katayama Y, Hagiwara R, Ito Y
2179 - 2188	Limitations of Potentiostatic Repassivation Techniques and Their Relationship to the Applicability of the High-Field Approximation to the Repassivation of Titanium Kolman DG, Scully JR
2189 - 2195	Coulometric Reduction of Oxides Formed on Copper, Nickel, and Iron Lee S, Staehle RW
2196 - 2203	Electrochemical Studies of Kinetic-Properties of Titanium-Hydrogen and Vanadium-Hydrogen Systems at Intermediate Temperatures Using Molten-Salt Techniques Liaw BY, Deublein G, Huggins RA
2204 - 2210	Study of the Anodic Current-Voltage Curve of an Iron-Nickel Alloy in Normal Sulfuric-Acid Ponthiaux P, Wenger F, Galland J
2210 - 2218	Surface Analytical Investigations of Electrochemically Formed Passive Layers on Binary Fe/Al Alloys Schaepers D, Strehblow HH
2219 - 2224	Iron K-Edge XANES Study of Iron and Iron-Oxides for the Cathodic Disbonding of Fusion Bonded Epoxy in Alkaline Aqueous-Solution Song I, Antonio MR, Payer JH
2225 - 2232	Growth of a Copper-Gold Alloy Phase by Bulk Copper Electrodeposition on Gold Investigated by in-Situ STM Andersen JE, Moller P
2233 - 2243	The Morphology of Electroless Ni Deposition on a Colloidal Pd(II) Catalyst Brandow SL, Dressick WJ, Marrian CR, Chow GM, Calvert JM
2244 - 2249	Alloying of a Less Noble-Metal in Electrodeposited Cu Through Underpotential Deposition Horkans J, Chang IC, Andricacos PC, Deligianni H
2250 - 2255	The Autocatalytic Deposition of Gold in Nonalkaline, Gold Thiosulfate Electroless Bath Sullivan AM, Kohl PA
2256 - 2260	Morphology Evolution of Zinc-Nickel Binary-Alloys Electrodeposited with Pulse Current Kondo K, Yokoyama M, Shinohara K
2261 - 2265	Electrochemical and Thermal-Behavior of Polyaniline in Aqueous-Solution Containing So42- Ions Maeda Y, Katsuta A, Nagasaki K, Kamiyama M
2266 - 2271	Anodic-Oxidation of Aluminum in Organic Electrolytes Under Nearly Anhydrous Conditions Ue M, Asahina H, Mori S
2272 - 2277	Fabrication of Oxocuprate Superconductor Microelectrodes for Sub-T-C Use Green SJ, Rosseinsky DR, Toohey MJ
2278 - 2286	In-Situ X-Ray-Absorption Spectroscopy Studies of Metal Hydride Electrodes Mukerjee S, Mcbreen J, Reilly JJ, Johnson JR, Adzic G, Petrov K, Kumar MP, Zhang W, Srinivasan S
2286 - 2290	Improvements in Fluorine Generation - Amorphous-Carbon Anodes with Vertical Channels Childs WV, Bauer GL
2290 - 2295	Repassivation Transients Measured with the Breaking-Electrode Technique on Aluminum Thin-Film Samples Frankel GS, Jahnes CV, Brusic V, Davenport AJ
2296 - 2301	Spectroscopic Investigation of a Polypyrrole/Mos42-/Mos3 Composite Film Electrode in Aqueous KCl Solution Girard F, Ye SY, Belanger D
2301 - 2305	The Role of Reactive Elements on Scale Growth in High-Temperature Oxidation of Pure Nickel, Iron, Cobalt, and Copper .2. Secondary-Ion Mass-Spectrometry Strawbridge A, Rapp RA, Sproule GI, Hussey RJ, Graham MJ
2306 - 2316	Frequency Regime Electrochemical Study of Silver Diffusion in on Ag2S-Ag2S(+al2O3) Bisectional Sample Ding SP, Petuskey WT
2317 - 2320	Electrochemical Synthesis of Oxide Thick-Film on the Stabilized Zirconia Surface in Molten-Salt Shan YJ, Nakamura T, Inaguma Y, Itoh M
2321 - 2325	On the Mechanism of Ito Etching in Halogen Acids - The Influence of Oxidizing-Agents Vandenmeerakker JE, Baarslag PC, Scholten M
2326 - 2331	TiW(N) as Diffusion-Barriers Between Cu and Si Chiou JC, Juang KC, Chen MC
2332 - 2340	Mechanisms of Deposition of SiO2 from Teos and Related Organosilicon Compounds and Ozone Dobkin DM, Mokhtari S, Schmidt M, Pant A, Robinson L, Sherman A
2341 - 2346	Transmission Electron-Microscopy Observation of the Early Growth-Stages of SiGe Grown on Si Substrates by Conventional Low-Pressure CVD Fujinaga K
2346 - 2351	Electron-Spin-Resonance Spectra of Silicon Dangling Bonds with Oxygen Back Bonds in Plasma-Deposited Amorphous SiOx Inokuma T, He L, Kurata Y, Hasegawa S
2352 - 2357	Development of Nitrogen Gas Bubbling Deaerator Made of Polyvinyliden Fluoride Ishihara Y, Yamane S, Yamazaki H, Tsuge H
2357 - 2362	FTIR in-Situ Studies of the Gas-Phase Reactions in Chemical-Vapor-Deposition of SiC Jonas S, Ptak WS, Sadowski W, Walasek E, Paluszkiewicz C
2362 - 2372	Metal Fume-Free Welding Technology for Advanced Semiconductor Grade Gas Delivery System Ohmi T, Miyoshi S, Shirai Y, Kojima T, Mizuguchi Y
2373 - 2377	Effect of Ozonated High-Purity Deionized Water on Polyvinyl-Chloride Pipe Sinha D
2377 - 2379	Observation of K2Sif6 Crystal-Growth During Secco Etching of Polycrystalline Silicon Shi ZR
2379 - 2385	Electrochemical Potential Measurements During the Chemical-Mechanical Polishing of Copper Thin-Films Steigerwald JM, Duquette DJ, Murarka SP, Gutmann RJ
2386 - 2388	A Wet Etching Technique for Accurate Etching of GaAs/AlAs Distributed Bragg Reflectors Bacher K, Harris JS
2389 - 2394	The Effect of Polymer Molecular-Weight and Solvent-Type on the Planarization of Spin-Coated Films Bullwinkel MD, Gu J, Campbell GA, Sukanek PC
2395 - 2401	Mechanisms of Metallic Impurity Deposition on Silicon Substrates Dipped in Cleaning Solution Mouche L, Tardif F, Derrien J
2401 - 2404	Desorption of Tungsten Fluorides from Tungsten Bell DA, Falconer JL, Mcconica CM
2405 - 2410	Effect of Oxygen Contamination on the Deposition and Etching Properties of Si-H-Cl-O and Si-H-F-O Systems Chung CH, Rhee SW, Moon SH
2411 - 2413	Electronic-Properties of N-Si(111) During Electrochemical Surface Transformation Toward H-Termination Dittrich T, Rauscher S, Bitzer T, Aggour M, Flietner H, Lewerenz HJ
2413 - 2417	Study of a New Chemical Etchant for GaSb (100)-Substrate and (111)-Substrate Preparation for Epitaxial-Growth Gladkov PS, Marinova T, Krastev V, Dinkov S
2418 - 2424	Dry-Etching of III/V-Semiconductors - Fine-Tuning of Pattern Transfer and Process-Control Kaindl J, Sotier S, Franz G
2425 - 2429	Nondestructive Detection of Microvoids at the Interface of Direct-Bonded Silicon-Wafers by Scanning Infrared Microscopy Khanh NQ, Hamori A, Fried M, Ducso C, Gyulai J
2430 - 2434	Suppression of Arsenic Autodoping with Rapid Thermal Epitaxy for Low-Power Bipolar Complementary Metal-Oxide-Semiconductor King CA, Johnson RW, Chiu TY, Sung JM, Morris MD
2434 - 2437	Effect of Oxygen Impurity on Microstructure and Boron Penetration in a Bf2+ Implanted LPCVD Stacked Amorphous-Silicon P(+) Gated pMOS Capacitor Lin CY, Pan FM, Chou PF, Chang CY
2438 - 2449	Selective Epitaxial-Growth of Silicon by the AC Technique .1. Nonimplanted Substrate/Oxide Surfaces Wang QS, Reisman A, Temple D, Alberti R
2450 - 2455	Selective Epitaxial-Growth of Silicon by the AC Technique .2. Ion-Implanted Substrate/Oxide Surfaces Wang QS, Reisman A, Temple D, Alberti R
2455 - 2457	Selective Epitaxial-Growth of Silicon by the AC Technique .3. Lateral Overgrowth Structures Wang QS, Reisman A, Temple D, Alberti R
2458 - 2463	Low-Temperature Atmospheric-Pressure Chemical-Vapor-Deposition for Epitaxial-Growth of SiGe Bipolar-Transistors Sedgwick TO, Grutzmacher DA
2463 - 2469	A Novel-Approach to the Characterization of Growth Striations in Czochralski Silicon-Crystals Shintani A, Miyano T, Hourai M
2470 - 2473	Indium Tin Oxide Dry-Etching Using HBr Gas for Thin-Film-Transistor Liquid-Crystal Displays Takabatake M, Wakui Y, Konishi N
2474 - 2479	Mass-Transport in Atomic Layer Deposition Carrier Gas Reactors Ylilammi M
2480 - 2485	Growth and XPS Characterization of Anodic Telluride Films on Hg1-xCdxTe Jain M, Nener BD, Warrington N, Baker MV, Robins JL, Faraone L
2486 - 2507	Plasma-Etching and Deposition for A-Si-H Thin-Film Transistors Kuo Y
2508 - 2516	Paramagnetic Point-Defects in Amorphous Thin-Films of SiO2 and Si3N4 - Updates and Additions Poindexter EH, Warren WL
2516 - 2516	Optimizing Wafer Polishing Through Phenomenological Modeling (Vol 142, Pg 2032, 1995) Runnels SR, Olavson T
L105 - L107	Effects of Thickness and Calcination Temperature on Tin Dioxide Sol-Derived Thin-Film Sensor Yoo DJ, Tamaki J, Park SJ, Miura N, Yamazoe N
L108 - L111	The Use of Eqcm for the Study of Nonactive Metal-Electrodes in Propylene Carbonate-Liasf6 Solutions - Significance of the Data Obtained Aurbach D, Zaban A
L111 - L113	A Novel Fingered Stacked Capacitor Cell Nguyen T, Nguyen SV, Dobuzinsky DM, Carl DA
L114 - L115	A New Cell Design for the Inverted Rotating-Disk Electrode Bressers PM, Kelly JJ
L116 - L118	The Interfacial Stability of Li with 2 New Solvent-Free Ionic Liquids - 1,2-Dimethyl-3-Propylimidazolium Imide and Methide Koch VR, Nanjundiah C, Appetecchi GB, Scrosati B
L119 - L120	A Methanol Impermeable Proton Conducting Composite Electrolyte System Pu C, Huang WH, Ley KL, Smotkin ES
L121 - L123	Acid-Doped Polybenzimidazoles - A New Polymer Electrolyte Wainright JS, Wang JT, Weng D, Savinell RF, Litt M