Journal of Vacuum Science & Technology A

Journal of Vacuum Science & Technology A, Vol.21, No.6 Entire volume, number list

ISSN: 0734-2101 (Print)

In this Issue (33 articles)

L23 - L27	Structural, electrical, and optical properties of diamondlike carbon films deposited by dc magnetron sputtering Broitman E, Lindquist OPA, Hellgren N, Hultman L, Holloway BC
L28 - L32	Measurement of the plasma potential adjacent to the substrate in a midfrequency bipolar pulsed magnetron Karkari SK, Vetushka A, Bradley JW
1809 - 1813	Effects of titanium content on sol-gel hard optical films prepared in an organic-inorganic hybrid system Que WX, Hu X
1814 - 1819	Effects of indium surfactant on the crystalline and optical properties of GaN during initial growth stage Yuan HR, Chua SJ, Tripathy S, Chen P
1820 - 1828	Effects of ion beam application on the deposition of low-resistivity titanium nitride films onto silicon Yokota K, Nakamura K, Kasuya T, Mukai K
1829 - 1836	Mechanical and tribological properties of sub- and superstoichiometric Ti-C and Ti-Si-C films deposited by magnetron sputtering-pulsed laser deposition Krzanowski J, Nainaparampil JJ, Phani AR
1837 - 1842	Etching characteristics and mechanism of Au thin films in inductively coupled Cl2/Ar plasma Efremov AM, Kim DP, Kim CI
1843 - 1848	Characterization of B-C-N hybrid prepared by ion implantation Shimoyama I, Baba YJ, Tetsuhiro S, Nath KG, Sasaki M, Okuno K
1849 - 1864	Stable and unstable behavior of inductively coupled electronegative discharges Marakhtanov AM, Tuszewski M, Lieberman MA, Chabert P
1865 - 1872	Fluorinated ethylene propylene copolymer coating for the stability enhancement of electroactive and photoactive systems Zhao LP, Neoh KG, Zhang Y, Kang ET
1873 - 1876	Control of pressure rise in a vacuum chamber by boron nitride and copper composite coating Oishi T, Konishi Y, Goto M, Kasahara A, Tosa M, Yoshihara K
1877 - 1882	Fe-doped photocatalytic TiO2 film prepared by pulsed dc reactive magnetron sputtering Zhang WJ, Li Y, Zhu SL, Wang FH
1883 - 1891	Antimony segregation in the oxidation of AlAsSb interlayers Andrews AM, van Horn KL, Mates T, Speck JS
1892 - 1894	Formation and annealing effect for close-packed Ge/Cu(111) layers Tsay JS, Chang LW, Yang AB
1895 - 1904	Microstructure and properties of ultrathin amorphous silicon nitride protective coating Yen BK, White RL, Waltman RJ, Dai Q, Miller DC, Kellock AJ, Marchon B, Kasai PH, Toney MF, York BR, Deng H, Xiao QF, Raman V
1905 - 1908	Microstructure of Mg-Ni thin film prepared by direct current magnetron sputtering and its properties as a negative electrode Ouyang LZ, Chung CY, Wang H, Zhu M
1909 - 1914	Influence of carbon content and average energy of deposited ions on mechanical and optical properties of Si-C-N films grown by plasma ion immersion processing Afanasyev-Charkin IV, Nastasi M
1915 - 1922	Plasma etching selectivity of ZrO2 to Si in BCl3/Cl-2 plasmas Sha L, Chang JP
1923 - 1926	Effect of an applied voltage during annealing on the resistivity and transparency of the amorphous tin oxide films Parkansky N, Alterkop B, Goldsmith S, Boxman RL
1927 - 1933	Investigation of the role of plasma conditions on the deposition rate and electrochromic performance of tungsten oxide thin films Seman M, Wolden CA
1934 - 1938	Temperature profile and crater formation induced in high-current pulsed electron beam processing Qin Y, Dong C, Wang XG, Hao SZ, Wu AM, Zou JX, Liu Y
1939 - 1942	Effects of pretreatment on the performance of diamond-coated cemented carbide cutting tools Wang Q, Zhang Q, Wang SG, Yoon SF, Ahn J, Zhao BQ, Tang WZ, Miao JQ, Lu FX
1943 - 1954	Comprehensive perspective on the mechanism of preferred orientation in reactive-sputter-deposited nitrides Kajikawa Y, Noda S, Komiyama H
1955 - 1963	Characteristics Of C4F8 plasmas with Ar, Ne, and He additives for SiO2 etching in an inductively coupled plasma (ICP) reactor Li X, Ling L, Hua XF, Oehrlein GS, Wang YC, Anderson HM
1964 - 1970	Fluorinated amorphous carbon thin films: Analysis of the role of the plasma excitation mode on the structural and mechanical properties Valentini L, Bellachioma MC, Ahmed SIU, Bregliozzi G, Gerbig Y, Haefke H, Lozzi L, Santucci S
1971 - 1977	Spatially resolved mass spectrometric sampling of inductively coupled plasmas using a movable sampling orifice Li X, Oehrlein GS, Schaepkens M, Ellefson RE, Frees LC
1978 - 1980	Radical detection in a methane plasma Kang HD, Dose V
1981 - 1987	Experimental and computer simulation studies of the "baffled target" reactive sputtering process Engelmark F, Westlinder J, Nyberg T, Berg S
1988 - 1992	Ion energy distributions and the density of CH3 radicals in a low pressure inductively coupled CH4/H-2 plasma used for nanocrystalline diamond deposition Okada K, Komatsu S, Matsumoto S
1993 - 1995	Effects of CF4 addition on oxygen contamination of SiC films in hot filament chemical vapor deposition using CH4+SiH4+H-2 Wang GJ, Wang B, Huang AP, Zhu MK, Wang BB, Yan H
1996 - 2002	Characterization of nonstoichiometric TiO2 and ZrO2 thin films stabilized by Al2O3 and SiO2 additions Kuo DH, Tzeng KH, Chien CH
2003 - 2006	Formation and clustering of individual point defects in pure tungsten and its slightly dilute alloys at ion irradiation Suvorov AL, Zaluzhnyi AG, Babaev VP, Zaluzhnyi AA
2007 - 2012	Effects of air exposure on ion beam assisted TiN : O coatings to prevent multipactor Castaneda SI, Diaz N, Raboso D, Montero I