화학공학소재연구정보센터

Thin Solid Films

Thin Solid Films, Vol.473, No.1 Entire volume, number list
ISSN: 0040-6090 (Print) 

In this Issue (26 articles)

1 - 8 Evolution of internal stress and microstructure in Ti50CU50 alloy films: influence of substrate temperature and composition
Bertel S, Abermann R
9 - 15 Lamellar growth in sputter-deposited aluminum-tin-aluminum sandwich layers
Eisenmenger-Sittner C, Bangert H, Joo HY, Barna PB, Kovacs A
16 - 23 Reactive pulsed laser deposition of thin molybdenum- and tungsten-nitride films
Bereznai M, Toth Z, Caricato AP, Fernandez M, Luches A, Majni G, Mengucci P, Nagy PM, Juhasz A, Nanai L
24 - 30 Growth of nanocrystalline diamond films in CCl4/H-2 ambient
Wu JJ, Ku CH, Wong TC, Wu CT, Chen KH, Chen LC
31 - 34 Fabrication of ZnO thin film diode using laser annealing
Lee SY, Shim ES, Kang HS, Pang SS, Kang JS
35 - 40 Transport phenomena in high performance nanocrystalline ZnO : Ga films deposited by plasma-enhanced chemical vapor deposition
Robbins JJ, Harvey J, Leaf J, Fry C, Wolden CA
41 - 48 Macrotexture and growth chemistry in ultrananocrystalline diamond thin films
Gerbi JE, Birrell J, Sardela M, Carlisle JA
49 - 53 Effect of annealing on the electrical and optical properties of electron beam evaporated ZnO thin films
Al Asmar R, Ferblantier G, Mailly F, Gall-Borrut P, Foucaran A
54 - 57 Growth of cubic and hexagonal CdTe thin films by pulsed laser deposition
Pandey SK, Tiwari U, Raman R, Prakash C, Krishna V, Dutta V, Zimik K
58 - 62 Influence of oxygen partial pressure on the structure and photoluminescence of direct current reactive magnetron sputtering ZnO thin films
Hong RJ, Qi HJ, Huang JB, He GB, Fan ZX, Shao JA
63 - 67 Fabrication and characterization of Fe3O4 thin films deposited by reactive magnetron sputtering
Pan LQ, Zhang GM, Fan CF, Qiu H, Wu P, Wang FP, Zhang Y
68 - 73 TiO2 anatase thin films deposited by spray pyrolysis of an aerosol of titanium diisopropoxide
Conde-Gallardo A, Guerreri M, Castillo N, Soto AB, Fragoso R, Cabanas-Moreno JG
74 - 79 Enhancement of remnant polarization in multilayered Bi4Ti3O12/(Bi3.25La0.75)Ti3O12 films obtained by chemical solution deposition
Wang Q, Shen MR
80 - 88 Sintering and color properties of nanocrystalline CeO2 films
Bertaux S, Reynders P, Heintz JM
89 - 97 Chemical, optical, vibrational and luminescent properties of hydrogenated silicon-rich oxynitride films
Kohli S, Theil JA, Dippo PC, Ahrenkiel RK, Rithner CD, Dorhout PK
98 - 103 CO3O4 protective coatings prepared by Pulsed Injection Metal Organic Chemical Vapour Deposition
Burriel M, Garcia G, Santiso J, Hansson AN, Linderoth S, Figueras A
104 - 113 X-ray photoelectron spectroscopy characterization of poly(2,3-diaminophenazine) films electrosynthesised on platinum
Losito I, Malitesta C, De Bari I, Calvano CD
114 - 122 Microstructural size effects on the hardness of nanocrystalline TiN/amorphous-SiNx coatings prepared by magnetron sputtering
Kauffmann F, Dehm G, Schier V, Schattke A, Beck T, Lang S, Arzt E
123 - 131 A comparative study of the mechanical strength of chemical vapor-deposited diamond and physical vapor-deposited hard coatings
Kamiya S, Nagasawa H, Yamanobe K, Saka M
132 - 136 Effect of oxygen plasma treatment on low dielectric constant carbon-doped silicon oxide thin films
Wang YH, Kumar R, Zhou X, Pan JS, Chai JW
137 - 144 Shortened photoconductance lifetime of Si/SiGe hetero structures due to interfacial oxygen or carbon from incomplete in-situ hydrogen cleans
Carroll MS, King CA
145 - 150 Study of the conduction properties of silicon-rich oxide under illumination
Yu ZR, Aceves-Mijares M
151 - 163 Surface-directed spinodal decomposition in a stressed, two-dimensional, thin film
Wise SM, Kim JS, Johnson WC
164 - 168 Improved adhesion of Au thin films to SiOx/Si substrates by dendrimer mediation
Li X, Huang F, Curry M, Street SC, Weaver ML
169 - 175 Transformation of microcrystalline silicon films by excimer-laser-induced crystallization
Hsieh IC, Lien SY, Wuu DS
176 - 176 Structural and electrochemical properties of vanadium oxide thin films grown by dc and rf reactive sputtering at room temperature (vol 460, pg 41, 2004)
Yoon YS, Kim JS, Choi SH