Thin Solid Films

Thin Solid Films, Vol.250, No.1-2 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (43 articles)

1 - 7	Microstructural Development in Physical Vapor-Deposited Partially-Stabilized Zirconia Thermal Barrier Coatings Sohn YH, Biederman RR, Sisson RD
8 - 15	Preparation and Characteristics of Y2O3-Doped CeO2 Film by RF Magnetron Sputtering Sugie Y, Mineshige A, Kobune M, Fujii S
16 - 19	Evaluation of New High-Temperature Boron Solid Planar Diffusion Sources Through P-N Junction Characterization Hwang DK, Tressler RE, Ruzyllo J
20 - 25	Characterization of Cobalt Annealed on Silicon-Germanium Epilayers Lin F, Sarcona G, Hatalis MK, Cserhati AF, Austin E, Greve DW
26 - 32	Direct-Current Reactive Magnetron-Sputtered Zinc-Oxide Thin-Films - The Effect of the Sputtering Pressure Meng LJ, Dossantos MP
33 - 36	Optical-Properties of Laser-Evaporated Cugase2 Films Near and Above the Fundamental Absorption-Edge Kindyak VV, Kindyak AS, Gremenok VF, Bodnar IV, Rud YV, Medvedkin GA
37 - 41	Surface Strains and Measurements of Misfit Dislocation Density by Diffraction Methods in Thin-Films on Substrates Junqua N, Grilhe J
42 - 46	Growth Modes of Epitaxial Copper-Films on C-Sapphire Knoll E, Bialas H
47 - 52	Study of Lithium Intercalation into Tungsten-Oxide Films Prepared by Different Methods Badilescu S, Ashrit PV, Minhha N, Bader G, Girouard FE, Truong VV
53 - 55	Combined Reaction and Diffusion-Controlled Kinetics of Silicidation Borisenko VE, Ivanenko LI, Krushevski EA
56 - 60	Growth and Structure of Polycrystalline Cr/Au Multilayered Thin-Films Bruckl H, Vancea J, Lecheler R, Reiss G, Hoffmann H
61 - 66	Oxidation of Iron, Aluminum and Titanium Films in the Temperature-Range 50-200-Degrees-C Martin M, Mader W, Fromm E
67 - 71	Experimental-Study of the Copper Thiosulfate System with Respect to Thin-Film Deposition Grozdanov I, Barlingay CK, Dey SK, Ristov M, Najdoski M
72 - 80	Development of Crystallinity and Morphology in Hafnium Dioxide Thin-Films Grown by Atomic Layer Epitaxy Ritala M, Leskela M, Niinisto L, Prohaska T, Friedbacher G, Grasserbauer M
81 - 86	Real-Time Ir and Mass Spectroscopic Study of the Reaction Process of Wf6 and A-Si-H-F Wadayama T, Shibata H, Ohtani T, Hatta A
87 - 91	Electrochemical-Behavior of Surface Zirconium-Oxides in the Presence of Some Electroactive Species Mogoda AS, Hefny MM, Salih SA, Elfaiky HE
92 - 100	Electronic and Crystallographic Structure of Gamma-Alumina Thin-Films Ealet B, Elyakhloufi MH, Gillet E, Ricci M
101 - 110	Growth and Properties of Thin Ag Films on Pt(100) Surfaces Struber U, Kastner A, Kuppers J
111 - 114	Reactions in Au/Nb Bilayer Thin-Films Kitada M
115 - 125	The Influence of Substrate Chemistry on the Adhesion of Electrolessly Deposited Ni(P) on Metal-Oxide Coated Ceramics Severin JW, Vanweert AA, Dewith G
126 - 131	Surface Physical and Chemical-Changes of Pure Iron After Molybdenum Ion-Implantation and Their Effects on the Tribological Behavior .2. Tribological Behavior Yang DH, Zhang XS, Xue QJ, Ding XJ, Lin WL
132 - 134	Phase-Structure Characteristics of RF Reactively Sputtered Zirconia Thin-Film Wang YH, Li XP
135 - 141	Yttrium-Oxide Film Deposition by a Langmuir-Blodgett Processing Technique and Its Incorporation into Oxide Scales by Substrate Oxidation Laursen T, Johnson DJ, Amm DT, Haysom JE
142 - 150	Alumina Coatings on PMMA - Optimization of Adherence Duchatelard P, Baud G, Besse JP, Jacquet M
151 - 156	A Comparison of 3 Techniques for Measuring Strain at Fracture of Thin-Film Materials Goforth RC, Chandran B, Ulrich RK, Nasrazadani S
157 - 163	Hardness, Internal-Stress and Fracture-Toughness of Epitaxial AlxGa1-xAs Films Hjort K, Ericson F, Schweitz JA, Hallin C, Janzen E
164 - 171	Thermal Strain in Indium Thin-Films Deposited on GaAs Substrates Ijichi H, Tadanaga O, Otsuki A, Murakami M
172 - 180	Investigation of Residual-Stress Generation During Thermal Spraying by Continuous Curvature Measurement Gill SC, Clyne TW
181 - 186	Evaluation of Coating Substrate Interface Strength by Differential Load Feed Analysis of Load-Indentation Measurements Rother B, Dietrich DA
187 - 193	Correlation of Structure and Optical-Properties of an Annealed Hydrogenated Amorphous Silicon-Carbon Alloy Film Basa DK
194 - 201	Alpha-Fe2O3 Thin-Films Prepared by Metalorganic Deposition (MOD) from Fe(III) 2-Ethylhexanoate Xue S, Ousibenomar W, Lessard RA
202 - 205	Optical-Properties of a Strained GaAs/Si Heterostructure After Rapid Thermal Annealing Kim DY, Kang TW, Kim TW
206 - 212	RF Plasma Deposition from Hexamethyldisiloxane Oxygen Mixtures Sahli S, Segui Y, Ramdani S, Takkouk Z
213 - 218	Quasi-Monolayer Deposition of Silicon Dioxide Gasser W, Uchida Y, Matsumura M
219 - 231	Anisotropic Spin Transport in Oriented Lithium Phthalocyanine Thin-Films Wachtel H, Wittmann JC, Lotz B, Petit MA, Andre JJ
232 - 237	Molecular-Beam Epitaxial-Growth of Smba2Cu3O7-Delta Thin-Films and Effect of Substrate-Temperature on the Surface-Roughness Schindler W, Vanhasselt P, Markl J, Bauer P, Tontsch P, Saemannischenko G
238 - 242	Fabrication of Thin Crystal Films of Organic-Compounds Ivakin GI, Klechkovskaya VV, Sukhorukov GB
243 - 248	Local-Structure of Metal-Ions in Arachidate Langmuir-Blodgett-Film Takeuchi S, Nogami Y, Ishiguro T, Oyanagi H
249 - 257	Ordered Langmuir-Blodgett-Films of a Substituted Lutetium Bisphthalocyanine Jones R, Hunter RA, Davidson K
258 - 262	Work Function Measurements for Gas-Detection Using Tin Oxide Layers with a Thickness Between 1-nm and 200-nm Flietner B, Eisele I
263 - 267	Dielectric-Properties of AlN Films Prepared by Laser-Induced Chemical-Vapor-Deposition Li X, Tansley TL, Chin VW
268 - 272	Target Current Spectroscopy of the Alkali-Halides KCl, CsCl and KBr Alidjanov EK, Atabaev BG, Gaipov S, Boltaev NN
273 - 278	Optical and Structural Characterizations of Cu+-Doped KCl Films Oliveira L, Cruz CM, Silva MA, Li MS