화학공학소재연구정보센터

Thin Solid Films

Thin Solid Films, Vol.315, No.1-2 Entire volume, number list
ISSN: 0040-6090 (Print) 

In this Issue (56 articles)

1 - 4 Effect of substrate temperature in chloroaluminum phthalocyanine thin films deposition studied by scanning tunneling microscopy and tunneling spectroscopy
Ohmori T, Masuda H, Shimura M, Kuroda J, Okumura T
5 - 8 New gamma-In2Se3/TCO (SnO2 or ZnO) thin film rectifying heterojunction
Marsillac S, Bernede JC
9 - 12 Patterning of a polysiloxane precursor to silicate glasses by microcontact printing
Marzolin C, Terfort A, Tien J, Whitesides GM
13 - 16 Epitaxial growth of Cu(111) films on Si(110) by magnetron sputtering: orientation and twin growth
Jiang H, Klemmer TJ, Barnard JA, Doyle WD, Payzant EA
17 - 21 Experimental survey of different precursor/solvent pairs for the deposition of tin dioxide by pyrosol
Smith A, Laurent JM, Smith DS, Bonnet JP
22 - 28 Dependence of the physical properties of SiNx : H films deposited by the ECR plasma method on the discharge size
Garcia S, Martin JM, Martil I, Gonzalez-Diaz G
29 - 34 Ultrasonic surface waves for studying the properties of thin films
Kuchler R, Richter E
35 - 39 Bias enhanced nucleation and bias textured growth of diamond on silicon(100) in hot filament chemical vapor deposition
Huang JT, Yeh WY, Hwang J, Chang H
40 - 43 FTIR reflection absorption spectroscopy for organic thin film on ITO substrate
Tamada M, Koshikawa H, Hosoi F, Suwa T
44 - 48 Quantitative analysis of growth process of carbon clusters C-n (n = 2,3,4)
Yanagihara T, Yomogita K
49 - 56 Growth of Ge layers on Si(100) monitored by in situ ellipsometry
Larciprete R, Cozzi S, Masetti E, Montecchi M, Padeletti G
57 - 61 Novel precursors for the growth of alpha-In2S3 : trisdialkyldithiocarbamates of indium
O'Brien P, Otway DJ, Walsh JR
62 - 65 Statistical approach for optimizing sputtering conditions of highly oriented aluminum nitride thin films
Akiyama M, Xu CN, Nonaka K, Shobu K, Watanabe T
66 - 71 Use of Auger- and photoelectron lines in the identification of chemical states of novel ternary Ti-Al-O films prepared by reactive magnetron sputtering ion plating
von Richthofen A, Cremer R, Domnick R, Neuschutz D
72 - 76 Porous structure of silica films obtained by monosilane oxidation
Dultsev FN, Nenasheva LA, Vasilyeva LL
77 - 85 Effect of the annealing temperature on structural and piezoelectric properties of the sol-gel Pb(Zr0.56Ti0.44)(0.90)(Mg1/3Nb2/3)(0.10)O-3 films
Sumi K, Qiu H, Kamei H, Moriya S, Murai M, Shimada M, Nishiwaki T, Takei K, Miyashita S, Hashimoto M
86 - 93 Epitaxial growth with phosphorus - 3. Formation of indium phosphide thin films using cyclohexylphosphine, (C6H11)PH2, as the organophosphorus source compound
Glass JA, Spencer JT
94 - 98 Effects of temperature and ZnSe well-layer thickness on PL in ZnSe/ZnS strained-layer superlattices
Hsu CT
99 - 103 MOCVD growth of Bi2Te3 layers using diethyltellurium as a precursor
Giani A, Boulouz A, Pascal-Delannoy F, Foucaran A, Boyer A
104 - 110 Dependence of structural features on substrates in Co/Cu multilayers
Li PQ, Shen HL, Saitoh Y, Fujimoto T, Kojima I
111 - 117 Preparation of TiO2 films on self-assembled monolayers by sol-gel method
Lin H, Kozuka H, Yoko T
118 - 122 Sulfide films on PbSe thin layer grown by MBE
Gautier C, Breton G, Nouaoura M, Cambon M, Charar S, Averous M
123 - 126 Influence of reactive gas pressure on the deposition of an AlN protective film for organic photoconductor
Miao XS, Chan YC, Pun EYB
127 - 138 Orientation specific effects on Pd/H deposits. Electrochemical measurements and potential calculations
Sittler F, Ramseyer C, Spielmann B, Girardet C, Pagetti J
139 - 143 Correlation between the oxidation behavior and the microstructure of SiC coatings deposited on graphite substrates via chemical vapor deposition
Kingetsu T, Takehara M, Yarii T, Ito K, Masumoto H
144 - 152 Microstructure, adhesion, microhardness, abrasive wear resistance and electrical resistivity of the plasma sprayed alumina and alumina-titania coatings
Ramachandran K, Selvarajan V, Ananthapadmanabhan PV, Sreekumar KP
153 - 158 Tension and fatigue behavior of a PVD TiN-coated material
Su YL, Yao SH, Wei CS, Wu CT
159 - 169 Plasma-sprayed ZrO2 thermal barrier coatings doped with an appropriate amount of SiO2
Chen HC, Pfender E, Heberlein J
170 - 178 Performance of 3C-SiC thin films as protective coatings for silicon-micromachined atomizers
Rajan N, Zorman CA, Mehregany M, DeAnna R, Harvey R
179 - 185 Gas and plasma nitriding pretreatments of steel substrates before CVD growth of hard refractory coatings
Abisset S, Maury F, Feurer R, Ducarroir M, Nadal M, Andrieux M
186 - 191 Comparative study of surface roughness measured on polysilicon using spectroscopic ellipsometry and atomic force microscopy
Petrik P, Biro LP, Fried M, Lohner T, Berger R, Schneider C, Gyulai J, Ryssel H
192 - 194 The effect of the vertical loan on the scraping test
Xie ZW, Zhu J
195 - 201 On the effects of stresses in ferroelectric (Pb,Ca)TiO3 thin films
Mendiola J, Calzada ML, Ramos P, Martin MJ, Agullo-Rueda F
202 - 206 Study on stress and strain of cubic boron nitride thin films
Zhang XW, Yue JS, Chen GH, Yan H
207 - 213 Analysis of the mechanical response of film on substrate systems presenting rough interfaces
Bordet H, Ignat M, Dupeux M
214 - 221 Measurement of fracture toughness of ultra-thin amorphous carbon films
Li XD, Bhushan B
222 - 228 Effect of annealing and hydrogen plasma treatment on the voltammetric and impedance behavior of the diamond electrode
Ramesham R
229 - 237 Carrier gas effects on the selectivity in chemical vapor deposition of copper
Kim S, Park JM, Choi DJ
238 - 243 Nb doped SrTiO3 thin films deposited by pulsed laser ablation
Fukushima K, Shibagaki S
244 - 250 Influence of molecular aggregation and orientation on the photoelectric properties of tetrasulfonated gallium phthalocyanine self-assembled on a microporous TiO2 electrode
Deng HH, Mao HF, Lu ZH, Xu HJ
251 - 256 Study on optical efficiency of alternating-current thin-film electroluminescent devices
Ye YH, Zhang JY, Gu PF, Tang JF
257 - 262 Electron microscopy analysis of the microstructure of Ti1-xAlxN alloy thin films prepared using a chemical vapour deposition method
Ikeda S, Gilles S, Chenevier B
263 - 265 Room temperature photoluminescence from erbium-doped silica thin films prepared by cosputtering
Gu G, Du YW, Yu T
266 - 272 Electrical properties of sol-gel-derived transparent titania films doped with ruthenium and tantalum
Lin H, Kumon S, Kozuka H, Yoko T
273 - 280 Efficiency of optical second harmonic generation from pentacene films of different morphology and structure
Jentzsch T, Juepner HJ, Brzezinka KW, Lau A
281 - 285 Influence of anodisation time, current density and electrolyte concentration on the photoconductivity spectra of porous silicon
Mehra RM, Agarwal V, Jain VK, Mathur PC
286 - 293 Scaling wafer stresses and thermal processes to large wafers
Nilson RH, Griffiths SK
294 - 300 Stability and superstructure of squarylium dye TSQ Langmuir-Blodgett films
Zhong TX, Workman RK, Yao XW, Jabbour GE, Peterson CA, Sarid D, Dirk CW, de la Cruz D, Nagarur A
301 - 304 Silver doping of thin CdS films by an ion exchange process
Ristova M, Ristov M, Tosev P, Mitreski M
305 - 309 Two-way shape memory effect of sputter-deposited thin films of Ti 51.3 at% Ni
Sato M, Ishida A, Miyazaki S
310 - 315 Influence of Cu overlayer on the properties of SnO2-based gas sensors
Cirilli F, Kaciulis S, Mattogno G, Galdikas A, Mironas A, Senuliene D, Setkus A
316 - 321 Optical characterization by spectroscopic ellipsometry of polycrystalline Si1-xGex of variable Ge composition up to 100% Ge
Ferrieu F, Morin C, Regolini JL
322 - 326 Fractal structure in the silver oxide thin film
Hou SM, Ouyang M, Chen HF, Liu WM, Xue ZQ, Wu QD, Zhang HX, Gao HJ, Pang SJ
327 - 335 Structural and physical properties of sprayed copper-zinc oxide films
Nasser SA, Afify HH, El-Hakim SA, Zayed MK
336 - 344 Oxidation behavior of CVD TiN-Ti5Si3 composite coatings
Llauro G, Gourbilleau F, Sibieude F, Hillel R
345 - 350 The strengthening mechanism of DLC film on silicon by MPECVD
Sung SL, Guo XJ, Huang KP, Chen FR, Shih HC