Thin Solid Films

Thin Solid Films, Vol.316, No.1-2 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (37 articles)

1 - 5	Power dependence of gate oxide damage from electron shading effect in high-density-plasma metal etching Hashimoto K, Shimpuku F, Hasegawa A, Hikosaka Y, Nakamura M
6 - 12	SiO2 etching characteristics in DC magnetron plasmas by using an external magnetic held Yamada H, Kuwahara K, Fujiyama H
13 - 17	Polyimide transmitted E-beam excited CF4 plasma etching Yamada T, Inanami R, Morita S
18 - 23	Diamond deposition procedure from microwave plasmas using a mixture of CO2-CH4 as carbon source Itoh K, Matsumoto O
24 - 28	Positive bias effects on the growth of diamond at pressures below 100 mTorr Teii K, Yoshida T
29 - 34	Diamond deposition on titanium and iron substrates pretreated in N-2-C2H2 plasma Sato T, Narumi S, Ito S, Akashi K
35 - 39	Microstructure and nanomechanical properties of cubic boron nitride films prepared by bias sputter deposition Yamada Y, Tsuda O, Yoshida T
40 - 44	Optical emission study of the laser plasma plume produced during diamondlike carbon thin film preparation Aoqui S, Ikegami T, Yamagata Y, Ebihara K
45 - 50	XPS structural characterization of hydrogenated amorphous carbon thin films prepared by shielded arc ion plating Taki Y, Takai O
51 - 55	High yield production of C-74 using an arc-discharge plasma Hatakeyama R, Hirata T, Ishida H, Hayashi T, Sato N
56 - 59	Spectroscopic study of the YBa2Cu3O7-x ablation plasma plume: crossover from the "blast" to the "drag" regime Yamagata Y, Shingai K, Grishin AM, Ikegami T, Ebihara K
60 - 64	Production of 1-m size uniform plasma by modified magnetron-typed RF discharge with a subsidiary electrode for resonance Urano Y, Li YL, Kanno K, Iizuka S, Sato N
65 - 67	A novel low temperature plasma generator with alumina coated electrode for open air material processing Koide M, Horiuchi T, Inushima T, Lee BJ, Tobayama M, Koinuma H
68 - 72	Preparation of Ti-Al gradient composite films by sputtering Takeda F, Nakajima T
73 - 78	TiN/Ti film formation by vacuum arc deposition with droplet shield plate Takikawa H, Shinsako K, Sakakibara T
79 - 84	Mass spectroscopy in plasma-enhanced chemical vapor deposition of silicon-oxide films using tetramethoxysilane Inoue Y, Takai O
85 - 88	Effects of UV light irradiation and excess Zn addition on ZnO : Al film properties in sputtering process Tominaga K, Umezu N, Mori I, Ushiro T, Moriga T, Nakabayashi I
89 - 92	Development of silica coating methods for powdered pigments with atmospheric pressure glow plasma Mori T, Tanaka K, Inomata T, Takeda A, Kogoma M
93 - 99	Total low temperature plasma process for epitaxial growth of compound semiconductors on Si : InSb/Si Yamauchi S, Hariu T, Ohba H, Sawamura K
100 - 104	Characterization of cementite films prepared by electron-shower-assisted PVD method Li SJ, Ishihara M, Yumoto H, Aizawa T, Shimotomai M
105 - 110	Evaporation from synthetic incinerator ashes melted by plasma arc Matsumaru K, Fukuyama H, Susa M, Nagata K
111 - 116	Ar torch plasma characteristics and its application to waste treatment Inaba T, Watanabe Y, Nagano M, Ishida T, Endo M
117 - 122	Generation of non-equilibrium plasma at atmospheric pressure and application for chemical process Sugiyama K, Kiyokawa K, Matsuoka H, Itou A, Hasegawa K, Tsutsumi K
123 - 127	Plasma induced degradation of chlorophenols in an aqueous solution Tezuka M, Iwasaki M
128 - 133	Formation and destruction processes of negative ions in a bounded plasma Wada M
134 - 138	An ab-initio molecular-orbital analysis on the initial plasma CVD process of a-Si: H film on glass substrate Miyazaki K, Nakajima K, Sato K, Koinuma H
139 - 147	Effects of antenna wavenumber spectrum and metal end plate on plasma characteristics excited by helicon wave Shinohara S, Kaneda N, Kawai Y
148 - 151	Chamber wall cleaning in a reactive ECR plasma Horiuchi K, Nishina A, Iizuka S, Sato N
152 - 157	Control of preferential orientation of AlN films prepared by the reactive sputtering method Ishihara M, Li SJ, Yumoto H, Akashi K, Ide Y
158 - 164	Plasma-induced free radicals of polycrystalline dicarbohydrates studied by electron spin resonance Kuzuya M, Yamauchi Y
165 - 168	Plasma modification of the inner surface of a rubber hose Saitoh S, Yoshikawa M, Naito K
169 - 173	Correlations between electrode phenomena and coating properties in wire arc spraying Watanabe T, Wang X, Pfender E, Heberlein J
174 - 177	In-flight nitriding of the MoSi2 powders in an Ar-N-2 induction plasma Fan XB, Ishigaki T
178 - 184	Concurrent preparation of carbon, boron nitride and composite nanotubes of carbon with boron nitride by a plasma evaporation method Shimizu Y, Moriyoshi Y, Komatsu S, Ikegami T, Ishigaki T, Sato T, Bando Y
185 - 188	High-rate deposition of LiNbO3 films by thermal plasma spray CVD Yamaguchi N, Hattori T, Terashima K, Yoshida T
189 - 194	Preparation of AlN fine powder by thermal plasma processing Oh SM, Park DW
VII - VII	Proceedings of the 10th Symposium on Plasma Science for Materials - Tokyo, Japan, June 11-12, 1997 - Preface Takai O, Horiike Y, Kawai Y, Koinuma H, Yoshida T