1 - 8 |
Correlation between plasma parameters, microstructure and optical properties of sputtering magnetron CNx films Lejeune M, Durand-Drouhin O, Charvet S, Grosman A, Ortega C, Benlahsen M |
9 - 16 |
Oxidation of tungsten nanoclusters Gillet M, Masek K, Lemire C |
17 - 22 |
Effect of electric field on spray deposited CdTe thin films Krishna KV, Dutta V, Paulson PD |
23 - 28 |
Effect of plasma duct bias on the plasma characteristics of a filtered vacuum arc source Kim JK, Kim DG, Byon E, Lee S, Kim KH, Lee GH |
29 - 37 |
Magnetron sputtered W-C films with C-60 as carbon source Palmquist JP, Czigany Z, Oden M, Neidhart J, Hultman L, Jansson U |
38 - 43 |
The crystalline properties of carbon nitride nanotubes synthesized by electron cyclotron resonance plasma Lai SH, Chen YL, Chan LH, Pan YM, Liu XW, Shih HC |
44 - 51 |
Growth of manganese oxide thin films by atomic layer deposition Nilsen O, Fjellvag H, Kjekshus A |
52 - 57 |
Characterization of indium nitride films deposited by activated reactive evaporation process Patil SJ, Bodas DS, Mandale AB, Gangal SA |
58 - 63 |
Growth structure and morphology of CoFe2/CoFe2O4 multilayers Jurca IS, Meny C, Viart N, Ulhaq-Bouillet C, Panissod R, Pourroy G |
64 - 69 |
Field emission properties of vertically aligned carbon nanotubes grown on bias-enhanced hydrogen plasma-pretreated Cr film Chen CF, Lin CL, Wang CM |
70 - 74 |
P-type strontium-copper mixed oxide deposited by e-beam evaporation Bobeico E, Varsano E, Minarini C, Roca F |
75 - 84 |
Analytical electron microscopy and Auger electron spectroscopy study of low-temperature diffusion in multilayer chromium-copper-nickel-gold thin films Danylenko MI, Watanabe M, Li C, Krajnikov AV, Williams DB, Vasiliev MA |
85 - 90 |
Adhesion and interfacial structure of magnetron sputtered TiNi films on Si/SiO2 substrate Fu YQ, Du HJ, Zhang S |
91 - 94 |
Pulsed laser deposition of epitaxial titanium diboride thin films Ferrando V, Marre D, Manfrinetti P, Pallecchi I, Tarantini C, Ferdeghini C |
95 - 98 |
Structural properties of SrWO4 films synthesized by pulsed-laser deposition Huang JY, Jia QX |
99 - 103 |
Preparation of carbon films from organic solutions by pulsed arc discharge at atmospheric pressure Ma ZB, Wan J, Huang YF, Wang JH |
104 - 110 |
Characterization and butanol/ethanol sensing properties of mixed tungsten oxide and copper tungstate films obtained by spray-sol-gel Damian MA, Rodriguez Y, Solis JL, Estrada W |
111 - 119 |
Systematic study of the evolution of texture and electrical properties of ZrNx thin films by reactive DC magnetron sputtering Liu CP, Yang HG |
120 - 124 |
Quantitative evaluation of sputtering induced surface roughness in depth profiling of polycrystalline multilayers using Auger electron spectroscopy Wang JY, Hofmann S, Zalar A, Mittemeijer EJ |
125 - 131 |
Plasma enhanced chemical vapor deposition of silicon oxide films using TMOS/O-2 gas and plasma diagnostics Bang SB, Chung TH, Kim Y |
132 - 137 |
The effect of ratio of deposition times and via density on via fill in aluminum multilayer metallization Deshmukh AR |
138 - 145 |
High-rate growth of epitaxial silicon at low temperatures (530-690 degrees C) by atmospheric pressure plasma chemical vapor deposition Mori Y, Yoshii K, Yasutake K, Kakiuchi H, Ohmi H, Wada K |
146 - 152 |
Roughness evolution of ZrO2 thin films grown by reactive ion beam sputtering Qi HJ, Huang LH, Tang ZS, Cheng CF, Shao JD, Fan ZX |
153 - 157 |
Surface OH groups governing surface chemical properties of SiO2 thin films deposited by RF magnetron sputtering Takeda S, Fukawa M |
158 - 164 |
Dependence of interface layer thickness in FeCo-Si multilayers on sputtering parameters Cho SJ, Krist T, Mezei F |
165 - 173 |
Thermal stability of Mo/Si multilayers with boron carbide interlayers Bottger T, Meyer DC, Paufler P, Braun S, Moss M, Mai H, Beyer E |
174 - 178 |
Microstructural changes of stearic acid films by immersion in salt solution Li XH, Li M, Huang L, Mai ZH |
179 - 188 |
Oxide film growth on Fe(111) and scanning tunneling microscopy induced high electric field stress in Fe2O3/Fe(111) Qin F, Magtoto NP, Garza M, Kelber JA |
189 - 198 |
Structure-hardness relations in sputtered Ti-Al-V-N films Polakova H, Musil J, Vlcek J, Allaart J, Mitterer C |
199 - 207 |
Fretting wear of metallic multilayer films Haseeb ASMA, Celis JP, Roos JR |
208 - 214 |
Two constant phase element behaviour of the admittance characteristics of GaAs metal-insulator-semiconductor structure with deep traps Kochowski S, Nitsch K, Paszkiewicz B, Paszkiewicz R |
215 - 220 |
Anisotropic optical properties of conjugated polymer and polymer/fullerene films Zhokhavets U, Goldhahn R, Gobsch G, Al-Ibrahim M, Roth HK, Sensfuss S, Klemm E, Egbe DAM |
221 - 226 |
Raman studies of In0.53Ga0.47As/InP multi quantum wells Varandani D, Dilawar N, Bandyopadhyay AK |
227 - 234 |
Patterned thin film transistors incorporating chemical bath deposited cadmium sulfide as the active layer Meth JS, Zane SG, Sharp KG, Agrawal S |
235 - 240 |
Stable TiO2/Pt electrode structure for lead containing ferroelectric thick films on silicon MEMS structures Duval FFC, Dorey RA, Haigh RH, Whatmore RW |
241 - 244 |
High-aspect ratio permanent photomask for solid-state chemical sensing array Chen H, L'Hereec F, Sasaki I, Janata J |
245 - 253 |
Luminescence properties of RP1-xVxO4: A (R=Y, Gd, La; A=Sm3+Er3+ x=0, 0.5, 1) thin films prepared by pechini sol-gel process Yu M, Lin J, Zhou YH, Pang ML, Han XM, Wang SB |
254 - 259 |
Plasma treatments of indium tin oxide anodes in carbon tetrafluorinde (CF4)/oxygen (O-2) to improve the performance of organic light-emitting diodes Chan IM, Hong FCN |
260 - 275 |
The bonding of plasma-sprayed hydroxyapatite coatings to titanium: effect of processing, porosity and residual stress Yang YC, Chang E |
276 - 281 |
Improvement of electrical properties of ferroelectric gate oxide structure by using Al2O3 thin films as buffer insulator Choi HS, Lim GS, Lee JH, Kim YT, Kim SI, Yoo DC, Lee JY, Choi IH |
282 - 289 |
Activation and stabilization of gallium arsenide anode in an aqueous photoelectrochemical cell Alqaradawi SY, Aljaber AS, Khader MA |
290 - 294 |
Stabilisation of the amorphous state of a thin layer sandwiched between two crystals Hyot B, Poupinet L, Desre PJ |
295 - 298 |
Identity of green single- and two-photon excited interband emission in thin film US on glass Yano S, Ulrich B |