Thin Solid Films

Thin Solid Films, Vol.516, No.19 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (32 articles)

6541 - 6541	20th symposium on plasma science of materials (SPSM-20) - Preface Hori M, Sekine M, Han JG, Stamate E, Ventzek P, Watanabe T
6542 - 6547	Integrated diagnostics of magnetron sputtering discharge Britun N, Han JG
6548 - 6552	Structure and properties of Ti-Si-N films with similar to 10 at.% Si deposited using reactive magnetron sputtering with high-flux low-energy ion assistance Li ZG, Miyake S, Makino M, Wu YX
6553 - 6559	Hydrogen isotope sputtering of graphite by molecular dynamics simulation Ito A, Nakamura H
6560 - 6564	Low temperature synthesis of ITO thin film on polymer in Ar/H-2 plasma by pulsed DC magnetron sputtering Moon CS, Han JG
6565 - 6569	Influence of hydrogen atoms on the growth of carbon based nanoparticles and of thin films from reactive plasmas Stepanovic O, Berndt J, Winter J
6570 - 6574	Numerical analysis of pressure dependence on carbon nanotube growth in CH4/H-2 plasmas Oda A, Suda Y, Okita A
6575 - 6579	Hydrogen-storage characteristics of hydrogenated amorphous carbon nitrides Ito H, Nozaki T, Saikubo A, Yamada N, Kanda K, Niibe M, Saitoh H
6580 - 6584	Formation of silicon carbide at low temperatures by chemical transport of silicon induced by atmospheric pressure H-2/CH4 plasma Kakiuchi H, Ohmi H, Yasutake K
6585 - 6591	High-density microwave plasma-enhanced chemical vapor deposition of microcrystalline silicon from dichlorosilane Ohse N, Hamada K, Saha JK, Kobayashi T, Takemura Y, Shirai H
6592 - 6597	Surface modification of fluorocarbon polymer films for improved adhesion using atmospheric-pressure nonthermal plasma graft-polymerization Okubo M, Tahara M, Saeki N, Yamamoto T
6598 - 6603	Physical properties and etching characteristics of metal (Al, Ag, Li) doped ZnO films grown by RF magnetron sputtering Jeong SH, Yoo DG, Kim DY, Lee NE, Boo JH
6604 - 6608	Estimation of defect generation probability in thin Si surface damaged layer during plasma processing Eriguchi K, Ohno A, Hamada D, Kamei M, Ono K
6609 - 6615	Self-assembled low-dimensional nanomaterials via low-temperature plasma processing Ostrikov K, Levchenko I, Xu S, Huang SY, Cheng QJ, Long JD, Xu M
6616 - 6621	Coatings and microstructures of monolithic TiB2 films and double layer and composite TiCN/TiB2 films from alkoxide solutions by thermal plasma CVD Shimada S, Takahashi A, Kiyono H, Tsujino J
6622 - 6627	Effects of feed rate and particle size on the in-flight melting behavior of granulated powders in induction thermal plasmas Yao Y, Hossain MM, Watanabe T, Tsujimura T, Funabiki F, Yano T
6628 - 6633	Electron temperature measurement of tungsten inert gas arcs Tanaka M, Tashiro S
6634 - 6639	A numerical analysis of plasma-particle heat exchange during in-flight treatment of granulated powders by argon-oxygen induction thermal plasmas Hossain AM, Yao Y, Watanabe T
6640 - 6644	Phase formation and luminescence properties in Eu3+-doped TiO2 nanoparticles prepared by thermal plasma pyrolysis of aqueous solutions Ikeda M, Li JG, Kobayashi N, Moriyoshi Y, Hamanaka H, Ishigaki T
6645 - 6649	Vaporization mechanism from Sn-Ag mixture by Ar-H-2 arc for nanoparticle preparation Tanaka M, Watanabe T
6650 - 6654	TiAlN film preparation by Y-shape filtered-arc-deposition system Mashiki T, Hikosaka H, Tanoue H, Takikawa H, Hasegawa Y, Taki M, Kumagai M, Kamiya M
6655 - 6659	Tribological properties of a-C : H : N thin films prepared using C2H2 and N-2 by CFUBM sputtering method Park YS, Cho HJ, Hong BY
6660 - 6667	Aerodynamic plasma actuators: A directional micro-jet device Benard N, Jolibois J, Moreau E, Sosa R, Artana G, Tochard G
6668 - 6672	Magnetized microdischarge plasma generation at low pressure Ito T, Kobayashi K, Hamaguchi S, Cappelli MA
6673 - 6676	Low temperature growth of polycrystalline Si on polyethylene terephthalate (PET) films using pulsed-plasma CVD under near atmospheric pressure Matsumoto M, Inayoshi Y, Suemitsu M, Yara T, Nakajima S, Uehara T, Toyoshima Y
6677 - 6682	Cu films deposition by dielectric barrier discharge in supercritical CO2, Ar and Xe environments Kikuchi H, Kubo H, Tomai T, Terashima K
6683 - 6687	Plasma-chemical surface functionalization of flexible substrates at atmospheric pressure Zettsu N, Itoh H, Yamamura K
6688 - 6693	Physicochemistry of the plasma-electrolyte solution interface Chen Q, Saito K, Takemura Y, Shirai H
6694 - 6698	Study on reaction field in arc-in-water to produce carbon nano-materials Sano N, Kawanami O, Charinpanitkul T, Tanthapanichakoon W
6699 - 6703	Fundamental study on quasi-real-time detection of airborne bio-particles using discharge plasma Rahman M, Tanino M, Hashimoto M, Nakano M, Yasuda H, Takashima K, Mizuno A
6704 - 6709	Continuous operation of commercial-scale plasma-chemical aftertreatment system of smoke tube boiler emission with oxidation reduction potential and pH control Kuroki T, Fujishima H, Otsuka K, Ito T, Okubo M, Yamamoto T, Yoshida K
6710 - 6714	Effect of stage control parameters on the FIB milling process Kim JH, Boo JH, Kim YJ