Electrochemical and Solid State Letters

Electrochemical and Solid State Letters, Vol.8, No.12 Entire volume, number list

ISSN: 1099-0062 (Print)

In this Issue (32 articles)

B69 - B71	Observation of extended copper passivity in carbonate solutions and its future application in copper CMP Ein-Eli Y, Abelev E, Auinat M, Starosvetsky D
B72 - B75	Pore morphology and self-organization effects during etching of n-type GaP(100) in bromide solutions Wloka J, Mueller K, Schmuki P
D43 - D45	Synthesis of silicon nanocrystals in silicon-rich SiO2 by rapid CO2 laser annealing Lin CJ, Lin GR, Chueh YL, Chou LJ
F59 - F62	Structurally and electrically uniform deposition of high-k TiO2 thin films on a Ru electrode in three-dimensional contact holes using atomic layer deposition Kim SK, Kim KM, Kwon OS, Lee SW, Jeon CB, Park WY, Hwang CS, Jeong J
F63 - F66	Low leakage BiFeO3 thin films fabricated by chemical solution deposition Chung CF, Wu JM
J35 - J37	Hydrogen permeation and chemical stability of cermet [Ni-Ba(Zr0.8-xCexY0.2)O-3] membranes Zuo CD, Lee TH, Song SJ, Chen L, Dorris SE, Balachandran U, Liu ML
A619 - A621	Nanostructured lanthanum manganate composite cathode Wang WG, Liu YL, Barfod R, Schougaard SB, Gordes P, Ramousse S, Hendriksen PV, Mogensen M
A622 - A626	Single-particle electrode aqueous microbatteries Palencsar A, Scherson DA
A627 - A629	Capacitance enhancement of activated carbon fiber cloth electrodes in electrochemical capacitors with a mixed aqueous solution of H2SO4 and AgNO3 Tanahashi I
A630 - A632	Electrochemically deposited polyaniline nanowire's network - A high-performance electrode material for redox supercapacitor Gupta V, Miura N
A633 - A636	Effects of neodymium oxide on electrochemical properties of V2O5 cathodes for Li/V2O5 secondary batteries Zhang Y, Hu XG, Liu YW, Cheng YS
A637 - A640	Effects of cr contents on the physical and electrochemical properties of LiNi0.5-xCr2xMn0.5-xO2 cathode materials for lithium-ion batteries Sun YC, Xia YG, Noguchi H
A641 - A645	Expanding the rate capabilities of the LiNi0.5Mn1.5O4 spinel by exploiting the synergistic effect between nano and microparticles Arrebola JC, Caballero A, Hernan L, Morales J
A646 - A649	Process parameters of A-V2O5 prepared by melt-quenching method Zhang Y, Hu XG, Liu YW, Gu QP, Cheng YS
A650 - A653	A novel anode material LiVMoO6 for rechargeable lithium-ion batteries Liu RS, Wang CY, Drozd VA, Hu SF, Sheu HS
C185 - C188	Assembled GaN : Mg inverted hexagonal pyramids formed through a photoelectrochemical wet-etching process Lin CF, Dai JJ, Yang ZJ, Zheng JH, Chang SY
C189 - C192	Controlled etching of InGaAlAs and GaAsSb using citric acid/hydrogen peroxide mixtures - High selectivity and good surface roughness Lijadi M, David C, Pelouard JL
C193 - C195	Helical nanoholes bored in silicon by wet chemical etching using platinum nanoparticles as catalyst Tsujino K, Matsumura M
G327 - G329	Improvement in light-output power of InGaN/GaN LED by formation of nanosize cavities on p-GaN surface Kang EJ, Huh C, Lee SH, Jung JJ, Lee SJ, Park SJ
G330 - G332	Low-temperature silicon wafer-scale thermocompression bonding using electroplated gold layers in hermetic packaging Park GS, Kim YK, Paek KK, Kim JS, Lee JH, Ju BK
G333 - G336	Metal wet etch process development for dual metal gate CMOS Hussain MM, Moumen N, Barnett J, Saulters J, Baker D, Zhang ZB
G337 - G340	High germanium content strained SGOI by oxidation of amorphous SiGe film on SOI substrates Gao F, Balakumar S, Balasubramanian N, Lee SJ, Tung CH, Kumar R, Sudhiranjan T, Foo YL, Kwong DL
G341 - G344	Enhancing the ambient-enduring performance of pentacene thin-film transistors by SnO2-encapsulation Kim WJ, Koo WH, Jo SJ, Kim CS, Baik HK, Lee J, Im S
G345 - G347	The effect of thermally induced stress on device temperature measurements by Raman spectroscopy Kim J, Freitas JA, Klein PB, Jang S, Ren F, Pearton SJ
G348 - G351	Mechanism of dynamic negative bias temperature instability of p-MOSFETs with 13 angstrom oxynitride gate dielectric Pan TM, Liu CH
G352 - G354	Annealing effects on AlGaN/GaN HEMTs employing excimer laser pulses Ha MW, Lee SC, Her JC, Seo KS, Han MK
G355 - G358	Electrical properties of poly-Si/ALD Hf-silicate gate stacks with various controlled Hf/(Hf plus Si) composition ratios fabricated using Hf[N(CH3) (C2H5](4) and SiH[N(CH3)(2)](3) precursors Kamiyama S, Miura T, Nara Y
G359 - G361	Diffusion-controlled selective wet etching of ZnCdO over ZnO Chen JJ, Ren F, Norton DP, Pearton SJ, Osinsky A, Dong JW, Chu SNG
G362 - G366	Microelectronics thin film handling and transfer using low-temperature wafer bonding Tan CS, Reif R
G367 - G370	Ultrathin HfO2 films treated by xenon flash lamp annealing for use as transistor gate dielectric replacements Kamiyama S, Miura T, Nara Y
G371 - G375	Unassisted water splitting from bipolar Pt/dye-sensitized TiO2 photoelectrode arrays Park JH, Bard AJ
H103 - H105	Magnetic field shape effect on electrical properties of TOLEDs in the deposition of ITO top cathode layer Kim HK, Lee KS, Keum MJ, Kim KH