| A9 - A11 |
A 4 V lithium-ion battery based on a 5 V LiNixMn2-xO4 cathode and a flake Cu-Sn microcomposite anode
Xia YY, Sakai T, Fujieda T, Wada M, Yoshinaga H |
| B7 - B10 |
Simultaneous in situ infrared reflection absorption spectroscopy and Kelvin probe measurements during atmospheric corrosion
Persson D, Axelsen S, Zou F, Thierry D |
| C9 - C12 |
Growth mechanism of Ru films prepared by chemical vapor deposition using bis(ethylcyclopentadienyl)ruthenium precursor
Matsui Y, Hiratani M, Nabatame T, Shimamoto Y, Kimura S |
| E5 - E7 |
Activity control of a heme peptide-modified electrode by an inhibitor bound to a thermoresponsive polymer
Tatsuma T, Mori H, Takahashi H, Fujishima A |
| F7 - F9 |
Enhancement of the chemical stability of hydrogenated aluminum nitride thin films by nitrogen plasma treatment
Cho MH, Kang YS, Kim HY, Lee PS, Lee JY |
| A12 - A15 |
Thermodynamic analysis of carbon deposition and electrochemical oxidation of methane for SOFC anodes
Koh JH, Kang BS, Lim HC, Yoo YS |
| A16 - A18 |
Anode properties of amorphous 50SiO center dot 50SnO powders synthesized by mechanical milling
Morimoto H, Tatsumisago M, Minami T |
| C13 - C16 |
Electrodeposition of copper from sulfate electrolytes - Effects of thiourea on resistivity and electrodeposition mechanism of copper
Donepudi VS, Venkatachalapathy R, Ozemoyah PO, Johnson CS, Prakash J |
| G11 - G13 |
Effect of stress on impurity-free quantum well intermixing
Deenapanray PNK, Jagadish C |
| G14 - G16 |
Aluminum-induced crystallization of amorphous silicon (alpha-Si : H) at 150 degrees C
Kishore R, Hotz C, Naseem HA, Brown WD |
| G17 - G19 |
Plasma chemistries for dry etching of SrBi2Ta2O9 thin films
Park JS, Im YH, Choi RJ, Hahn YB, Choi CS, Lee SH, Lee JK |
| G20 - G22 |
Chemical mechanical polishing of copper and tantalum in potassium iodate-based slurries
Li Y, Babu SV |
