화학공학소재연구정보센터
Thin Solid Films, Vol.518, No.10, 2796-2800, 2010
Microstructure and thermoelectric properties of Heusler Fe2VAl thin-films
Heusler-type Fe2VAl thin-films were prepared on zirconia substrate by radio-frequency magnetron sputtering. The effect of deposition temperature on crystal structure and electrical properties was investigated. The degree of Heusler-type ordering in crystal structure was enhanced by the increase in deposition temperature. The enhanced Heusler-type ordering contributed to the formation of a steep density of state derived from pseudogap opening near Fermi level, resulting in large Seebeck coefficient. Since the film consisted of submicrometer-size grains, the electrical conductivity and the thermal conductivity of the film were both reduced by the grain boundary effect. The estimated thermoelectric power factor was 1.0 mW/mK(2) at 350 K. (C) 2009 Elsevier B.V. All rights reserved.