다단계 습식 식각을 통한 수소처리된 Al-doped ZnO 박막의 특성

탁성주; 강민구; 박성은; 김용현; 김원목; 김동환; Sung Ju Tark; Min Gu Kang; Sungeun Park; Yong Hyun Kim; Won Mok Kim; Donghwan Kim

Korean Journal of Materials Research, Vol.19, No.5, 259-264, May, 2009

DOI10.3740/MRSK.2009.19.5.259 Export Citation

다단계 습식 식각을 통한 수소처리된 Al-doped ZnO 박막의 특성

Properties of Hydorogenated Al-Doped ZnO Films by Multi-Step Texture

탁성주, 강민구, 박성은, 김용현, 김원목¹, 김동환 ^†

고려대학교 신소재공학과
¹한국과학기술연구원 재료연구부 박막재료연구센터

Sung Ju Tark, Min Gu Kang, Sungeun Park, Yong Hyun Kim, Won Mok Kim¹, and Donghwan Kim^†

Department of Materials Science and Engineering, Korea University, Seoul 136-701, Korea
¹Thin Film Materials Research Center, Division of Materials, Korea Institute of Science and Technology, Seoul 130-650, Korea

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In this study we investigated the effect of the multi-step texturing process on the electrical and optical properties of hydrogenated Al-doped zinc oxide (HAZO) thin films deposited by rf magnetron sputtering. AZO films on glass were prepared by changing the H2/(Ar+H2) ratio at a low temperature of 150 oC. The prepared HAZO films showed lower resistivity and higher carrier concentration and mobility than those of nonhydrogenated AZO films. After deposition, the surface of the HAZO films was multi-step textured in diluted HCl (0.5%) for the investigation of the change in the optical properties and the surface morphology due to etching. As a result, the HAZO film fabricated under the type III condition showed excellent optical properties with a haze value of 52.3%.

Keywords:ZnO : Al;hydrogenated;rf magnetron sputter;TCO;surface textured

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[Related Articles]

[1] Lan WS, Fonash SJ, J. Electron Mater., 16, 141 (1987)

[2] Yamada A, Wenas WW, Yoshino M, Jpn. J. Appl. Phys., 30, L1152 (1991)

[3] Mizuhashi M, Goto Y, Adachi K, Jpn J Appl Phys., 27, 2053 (1988)

[4] Lan WS, Fonash SJ, J. Electron. Mater., 16, 141 (1987)

[5] Muller J, Rech B, Springer J, Vanecek M, Sol. Energy, 77(6), 917 (2004)

[6] Ng HM, Shin MH, Chung YM, Han JG, Lee NE, J. Vac. Sci. Technol. A., 23, 4 (2005)

[7] Van de Walle CG, Phys. Rev. Lett., 85, 1012 (2000)

[8] Van de Walle CG, Neugebauer J, Nature, 423, 626 (2003)

[9] Ellmer K, Klein A, Reech B, Transparent conductive Zinc oxide, p.382, Hull R, Springer, Germany, (2007). (2007)

[10] Kim KH, Park KC, Ma DY, J. Appl. Phys., 81, 7764 (1997)

[11] Hamberg I, Granqvist CG, J. Appl. Phys., 60, R123 (1986)