Applied Chemistry for Engineering, Vol.27, No.1, 101-109, February, 2016
평판디스플레이용 유리의 박판화공정을 위한 비불산형 식각액
Non-HF Type Etching Solution for Slimming of Flat Panel Display Glass
초록
기존의 불산을 대체할 수 있는 평판디스플레이용 유리의 식각용액을 개발하고자 진행하였다. 본 연구과정을 통해 제안된 불산 대체 유리 식각용액은 산성불화암모늄 18~19 wt%, 황산 24~25 wt%, 물 45~46 wt%, 황산염 4~5 wt%, 규불화염 7~8 wt%로 구성되며, 사용된 식각용액의 재사용 시 보충용액으로서 해당조성의 식각용액을 전체의 5% 되게 보충함으로서 효과적으로 지속적으로 재사용이 가능하다. 개발된 식각용액은 30 ℃에서 5 μm/min 이상의 식각속도를 나타내며, 반복 재사용 시에도 초기 식각액 전체 질량의 5% 추가로 보충함으로서 식각속도는 0.1 μm/min 이하로 편차로 식각속도가 안정적으로 유지되었다. 이 식각공정을 통해 얻어진 평판디스플레이용의 유리의 표면 상태는 Pin hole, Dimple 등이 발견되지 않는 양호한 품질을 나타내었다.
The purpose of this research was to develop a flat panel display device’s glass etchant which can replace hydrofluoric acid. The glass etchant was composed of 18~19% wt% of ammonium hydrogen fluoride, 24~25 wt% of sulfuric acid, 45~46 wt% of water, 4~5 wt% of sulfate and 7~8 wt% of fluoro-silicate. By replenishing the etchant which has the amount of 5% of initial solution’s mass, it was possible to reuse the etchant continuously. The developed etchant showed 5μm/min of etching rate at 30 ℃. The reusable etchant, with replenishing 5% of initial etchant mass showed the stable etching rate, which has the deviation of less than 0.1 μm/min etching rate. The glass surface of flat panel display device created from our etching process was in good condition with any defects such as pin hole and dimple.
- Byun JY, J. Microelectronics Packing Society, 15, 41 (2008)
- Cho SH, Youn SW, Kang CG, Observation of Growth Behavior of Induced Hillock for Nano/Micro Patterning on Surface of Borosilicate with Etching Time and Load, Proceedings of the Korean Society for Technology of Plasticy Autumn Conference, October 11-14, Seoul Korea (2005).
- Kim HT, Glass Thinning by Fluoride Based Compounds Solution with Low Hydrofluoric acid Concentration, Master Dissertation, Hoseo University, Asan, Korea (2009).
- Techno Semichem Corporation, Etching Composition for LCD Glass, KOR Patent 0052475 (2005).
- Bellman RA, Davis RW, Lapp JC, Walton RM, Chemical Durability of EAGLE XG™ in LCD Dry Etch Processes, Corning Inc, Sullivan Park, Corning, P-48.2, NY, USA (2005).
- Iliescu C, Chena B, Miao J, Sens. Actuators A-Phys., 143, 154 (2008)
- Dongwoo Fine-Chem, Etching solution composition, KOR Patent 0061610 (2008).
- Takoma technology corporation, Etching composition, KOR Patent 0112782 (2009).
- Chemtronics Corporation, Etchant Composition for Glass Substrate, KOR Patent 0124792 (2007).
- Exax Corporation, Echant composition for glass of flat panel display, KOR Patent 0082540 (2007).