Korean Chemical Engineering Research, Vol.54, No.2, 157-162, April, 2016
전착법을 이용한 슈퍼커패시터용 다공성 Co(OH)2 나노플레이크 박막의 제조 및 전기화학적 특성
Electrochemical Properties of Porous Co(OH)2 Nano-flake Thin Film Prepared by Electro-deposition for Supercapacitor
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초록
다공성 Co(OH)2 나노플레이크 박막은 전위제어 전착법을 이용하여 티타늄 메쉬에 여러 전착전위(-0.75, -1.0, -1.2 및 -1.4 V)에서 전착하여 슈퍼커패시터에 이용하였다. 티타늄 메쉬에 전착된 Co(OH)2 나노플레이크 박막의 두께 및 전착량은 전착전위의 제어에 의해 결정되었고 -1.4 V에서 전착한 Co(OH)2 나노플레이크 박막의 두께는 약 34 μm로 가장 두껍게 전착되었으며 전착량은 17.2 g이다. 전착전위 -0.75, -1.0, -1.2 및 -1.4 V에서 전착한 경우 초기 방전용량은 각각 226, 370, 720 그리고 1,008 mF cm-2으로 나타났고 1,000 사이클 후 각각 206, 349, 586 그리고 866 mF cm-2으로 나타났다. 또한 이들의 용량유지율은 각각 91, 94, 81 및 86%로 나타났다.
Porous Co(OH)2 nano-flake thin films were prepared by a potential-controlled electro-deposition technique at various deposition voltage (-0.75, -1.0, -1.2, and -1.4 V) on Ti-mesh substrates for supercapacitor application. The potential of electrode was controlled to regulate the film thickness and the amount of Co(OH)2 nano-flake on the titanium substrate. The film thickness was shown to reach the maximum value of 34 μm at -1.4 V of electrode potential, where 17.2 g of Co(OH)2 was deposited on the substrate. The specific discharge capacitances were measured to be 226, 370, 720, and 1008 mF cm-2 in the 1st cycle corresponding to the films which were formed at -0.75, -1.0, -1.2, and -1.4 V of electrode potentials, respectively. Then the discharge capacities were decreased to be 206, 349, 586 and 866 mF/cm2, where the persistency rates were 91, 94, 81, and 86%, respectively.
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