Carbon nitride (CNx) alloy thin films were deposited by pulsed laser deposition (PLD) with varying nitrogen gas pressure (NP) from 0.1 to 800 mTorr at 20degreesC of substrate temperature (ST) and with varying ST from 20 to 500degreesC at 0.8 Torr of NP. The effects of the NP and ST on the composition, structural and electrical properties of the nitrogen (N) incorporated camphoric carbon (CC) films have been investigated by standard measurement techniques. We found that, the amorphous structure of CNx films can be changed by NP and ST, and the CNx films with high N content have relatively high electrical resistivity.