(SrMnO3)(x)/(La(0.7)Sr(0.3)MnO(3))y/(SrMnO3)z (x,y,z=number of unit cells) trilayers have been grown using a Reflection High Energy Electron Diffraction calibrated layer-by-layer molecular beam epitaxy technique. X-Ray Reflectivity and X-Ray Diffraction measurements confirm the structural quality and the abruptness of the interfaces. Electrical transport property analysis as a function of temperature show effects related to the spatial confinement of the charge carriers induced by the layering. These results are important in view of future developments of oxide based heterostructures for innovative quantum devices.