화학공학소재연구정보센터
Korean Journal of Materials Research, Vol.28, No.10, 595-600, October, 2018
스퍼터링 방법으로 성장한 코발트크롬철망간니켈 고엔트로피 질산화물 박막의 구조특성
Structural Characterization of CoCrFeMnNi High Entropy Alloy Oxynitride Thin Film Grown by Sputtering
E-mail:
This study investigates the microstructural properties of CoCrFeMnNi high entropy alloy (HEA) oxynitride thin film. The HEA oxynitride thin film is grown by the magnetron sputtering method using nitrogen and oxygen gases. The grown CoCrFeMnNi HEA film shows a microstructure with nanocrystalline regions of 5~20 nm in the amorphous region, which is confirmed by high-resolution transmission electron microscopy (HR-TEM). From the TEM electron diffraction pattern analysis crystal structure is determined to be a face centered cubic (FCC) structure with a lattice constant of 0.491 nm, which is larger than that of CoCrFeMnNi HEA. The HEA oxynitride film shows a single phase in which constituting elements are distributed homogeneously as confirmed by element mapping using a Cs-corrected scanning TEM (STEM). Mechanical properties of the CoCrFeMnNi HEA oxynitride thin film are addressed by a nano indentation method, and a hardness of 8.13 GPa and a Young’s modulus of 157.3 GPa are obtained. The observed high hardness value is thought to be the result of hardening due to the nanocrystalline microstructure.
  1. Yeh JW, Chen SK, Lin SJ, Gan JY, Chin TS, Shun TT, Tsau CH, Chang SY, Adv. Eng. Mater., 6, 299 (2004)
  2. Tong CJ, Chen YL, Chen SK, Yeh JW, Shun TT, Tsau CH, Lin SJ, Chang SY, Metall. Mater. Trans., 36, 881 (2005)
  3. Murty B, Yeh JW, Ranganathan S, High-entropy alloys, Butterworth-Heinemann (2014).
  4. Gludovatz B, Hohenwarter A, Catoor D, Chang EH, George EP, Ritchie RO, Science, 345(6201), 1153 (2014)
  5. Chen YY, Duval T, Hung UD, Yeh JW, Shih HC, Corrosion Sci., 47, 2257 (2005)
  6. Otto F, Dlouhv A, Somsen C, Bei H, Eggeler G, George EP, Acta Mater., 61, 5743 (2013)
  7. He JY, Liu WH, Wang H, Liu XJ, Nieh TG, Lu ZP, Acta Mater., 62, 105 (2014)
  8. Hsu CY, Yeh JW, Chen SK, Shun TT, Metall. Mater. Trans. A-Phys. Metall. Mater. Sci., 35, 1465 (2004)
  9. Li ZM, Pradeep KG, Deng Y, Raabe D, Tasan CC, Nature, 534(7606), 227 (2016)
  10. Pradeep KG, Tasan CC, Yao MJ, Deng Y, Springer H, Raabe D, Mater. Sci. Eng. A-Struct. Mater. Prop. Microstruct. Process., 648, 183 (2015)
  11. Schuh B, Martin FM, Volker B, George EP, Clemens H, Pippan R, Hohenwarter A, Acta Mater., 96, 258 (2015)
  12. Dolique V, Thomann AL, Brault P, Tessier Y, Gillon P, Surf. Coat. Technol., 204, 1989 (2010)
  13. Wu ZF, Wang XD, Cao QP, Zhao GH, Li JX, Zhang DX, Zhu JJ, Jiang JZ, J. Alloy. Compd., 609, 137 (2014)
  14. Lin PC, Cheng CY, Yeh JW, Chin TS, Entropy, 18, 308 (2016)
  15. An Z, Jia H, Wu Y, Rack PD, Patchen AD, Liu Y, Ren Y, Li N, Liaw PK, Mater. Res. Lett., 3, 203 (2015)
  16. Xie L, Brault P, Thomann AL, Yang X, Zhang Y, Shang G, Intermetallics, 68, 78 (2016)
  17. Han CS, Kim SW, Korean J. Mater. Res., 28(3), 159 (2018)
  18. Chen TK, Shun TT, Yeh JW, Wong MS, Surf. Coat. Technol., 188-189, 193 (2004)
  19. Huang PK, Yeh JW, Thin Solid Films, 518(1), 180 (2009)
  20. Ren B, Liu ZX, Shi L, Cai B, Wang MX, Appl. Surf. Sci., 257(16), 7172 (2011)
  21. Chen TK, Wong MS, J. Mater. Res., 23, 3075 (2008)
  22. Chen TK, Wong MS, Surf. Coat. Technol., 203, 495 (2008)
  23. Huang YS, Chen L, Lui HW, Cai MH, Yeh JW, Mater. Sci. Eng. A-Struct. Mater. Prop. Microstruct. Process., 457, 77 (2007)
  24. Yu RS, Huang RH, Lee CM, Shieu FS, Appl. Surf. Sci., 263, 58 (2012)
  25. Tsai DC, Deng MJ, Chang ZC, Kuo BH, Chen EC, Chang SY, Shieu FS, J. Alloy. Compd., 647, 179 (2015)
  26. Cullity BD, Stock SR, Elements of X-Ray Diffraction, 3rd ed., Pearson, Upper Saddle River (2001).
  27. Cantor B, Chang ITH, Knight P, Vincent AJB, Mater. Sci. Eng. A-Struct. Mater. Prop. Microstruct. Process., 375, 213 (2004)
  28. Najafi H, Karimi A, Alexander D, Dessarzin P, Morstein M, Thin Solid Films, 549, 224 (2013)
  29. Hadraba H, Chlup Z, Dlouhy A, Dobes F, Roupcova P, Vilemova M, Matejicek J, Mater. Sci. Eng. A-Struct. Mater. Prop. Microstruct. Process., 689, 252 (2017)