Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology A, Vol.13, No.3, 1639-1643, 1995 DOI10.1116/1.579744 Export Citation Physical-Properties of Thin Carbon Nitride Films Deposited by Electron-Cyclotron-Resonance Assisted Vapor-Deposition Bousetta A, Lu M, Bensaoula A Keywords:AMORPHOUS-CARBON Please enable JavaScript to view the comments powered by Disqus.
