A method to coat thin wires, 25 mu m in diameter, with fluorocarbon material that is flexible and conformal has been achieved using pulsed plasma enhanced chemical vapor deposition (PECVD). This process enables the chemical composition of the films to be tailored in order to achieve similar stoichiometry and chemical composition to bulk polytetrafluoroethylene [PTFE, (CF2)(n), Teflon (TM)]. The deposited film had a F/C ratio of 1.9 and a CF2 fraction of 65%. In comparison, a film deposited under continuously applied power had a F/C ratio of only 1.6 and a CF2 fraction of 32% and was found to form brittle wire coatings. The flexibility of the pulsed PECVD film was consistent with its connectivity number of 2.1 corresponding to an underconstrained, flexible material. In addition, the connectivity number for the brittle film was 2.5, consistent with an overconstrained brittle network.