Ion beam enhanced deposition was adopted to synthesize titanium dioxide (TiO2) films. The films were prepared by Ti evaporation and Xe+ ion beam bombardment in an O-2 environment. The xenon ion energy varied from 40 to 80 keV. The compositions of the TiO2 films were studied by Rutherford backscattering analysis. All the films were close to stoichiometric. The structure of the films were researched by x-ray diffraction. The results showed that the titanium oxide films exhibit a rutile phase structure with high (200) orientation. The optical properties were also studied using ultraviolet-visible transmission spectrometry.