Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology B, Vol.12, No.6, 3300-3305, 1994 DOI10.1116/1.587616 Export Citation Pulse-Time Modulated Electron-Cyclotron-Resonance Plasma-Etching for Highly Selective, Highly Anisotropic, and Less-Charging Polycrystalline Silicon Patterning Samukawa S, Terada K Please enable JavaScript to view the comments powered by Disqus.
