Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology B, Vol.12, No.6, 3954-3958, 1994 DOI10.1116/1.587409 Export Citation Fabrication of Controlled Slope Attenuated Phase-Shift X-Ray Masks for 250 nm Synchrotron Lithography Gentili M, Difabrizio E, Grella L, Baciocchi M, Mastrogiacomo L, Maggiora R, Xiao J, Cerrina F Keywords:REPLICATION Please enable JavaScript to view the comments powered by Disqus.
