Journal of Vacuum Science & Technology B, Vol.13, No.1, 105-110, 1995
Ellipsometry Study of the Nucleation of Si Epitaxy by Electron-Cyclotron-Resonance Plasma Chemical-Vapor-Deposition
Keywords:HYDROGENATED AMORPHOUS-SILICON;LOW-TEMPERATURE;SPECTROSCOPIC ELLIPSOMETRY;FILM DEPOSITION;GROWTH;SILANE