Ultraviolet radiation induces compaction in fused silica. Using stress-induced birefringence as a dosimeter, we are able to measure refractive index changes over the range of 20 ppb-1.5 ppm and have found a general description of compaction versus 193 nm dose valid for a wide range of intensities, pulse rates, and fused silicas. Using the experimental data, we evaluate the effect of compaction damage on a model 193 nm optic. Zernike phase aberration terms from compaction in elements near the pupil plane of the system are calculated using Fourier optics while aberrations from other elements are estimated using ray-tracing. Aerial image simulations show significant distortion and focal shifts occur at the edge of the image field for only a 0.05 lambda total rms compaction-induced wave front aberration. The useful life of the model system depends strongly on the throughput, resist sensitivity, and partial coherence. For a system operating at 10 million pulses per day with a 70% clear field mask and sigma of 0.5, we predict a life range of 6 months to 12 years for resist sensitivities ranging from 50 mJ/cm(2) to 10 mJ/cm(2). This life prediction increases by over factor of 2 for sigma of 0.7.